发明申请
US20160340780A1 APPARATUS AND METHOD RELATED TO REACTION CHAMBER WITH SHUTTER SYSTEM 审中-公开
与具有快门系统的反应室相关的装置和方法

APPARATUS AND METHOD RELATED TO REACTION CHAMBER WITH SHUTTER SYSTEM
摘要:
A reaction chamber assembly with a shutter system may be used in the processing of semiconductor substrates. The shutter system may facilitate gas flow control and temperature control within the reaction chamber assembly.
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