公开(公告)号：US20160340780A1

公开(公告)日：2016-11-24

申请号：US14719472

申请日：2015-05-22

Applicant: ASM IP HOLDING B.V.

Inventor： Paul Swan ,  Wentao Wang ,  Timothy J. Sullivan ,  Michael C. Sarin

IPC: C23C16/458 ,  C23C16/455

CPC classification number: C23C16/4411 ,  C23C16/4412 ,  C23C16/54

Abstract: A reaction chamber assembly with a shutter system may be used in the processing of semiconductor substrates. The shutter system may facilitate gas flow control and temperature control within the reaction chamber assembly.

Abstract translation: 具有快门系统的反应室组件可用于半导体衬底的处理。 快门系统可以促进反应室组件内的气体流量控制和温度控制。