Invention Application
- Patent Title: SIMULTANEOUSLY MEASURING DEGRADATION IN MULTIPLE FETS
- Patent Title (中): 同时测量多个FET中的降解
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Application No.: US14716070Application Date: 2015-05-19
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Publication No.: US20160341785A1Publication Date: 2016-11-24
- Inventor: Karthik Balakrishnan , Keith A. Jenkins , Christos Vezyrtzis
- Applicant: International Business Machines Corporation
- Main IPC: G01R31/26
- IPC: G01R31/26

Abstract:
A structure and method of testing degradation of semiconductor devices by stressing an array of several semiconductor devices at the same time and measuring the resulting degradation separately for each individual device to obtain an estimate of its expected lifetime is provided. The devices may be subjected to stress that is either in a pulsed state or in a DC state. An on-chip pulse generator may be used for stressing in the pulsed state.
Public/Granted literature
- US09702924B2 Simultaneously measuring degradation in multiple FETs Public/Granted day:2017-07-11
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