发明申请
- 专利标题： ROTATABLE FRAME, LITHOGRAPHIC APPARATUS, PROJECTION SYSTEM, METHOD FOR FOCUSING RADIATION AND DEVICE MANUFACTURING METHOD
- 专利标题（中）： 可旋转框架，光刻设备，投影系统，聚焦辐射和装置制造方法
-
申请号： US15235542申请日： 2016-08-12
-
公开(公告)号： US20160349628A1公开(公告)日： 2016-12-01
- 发明人: Arno Jan BLEEKER , Thomas Josephus Maria CASTENMILLER , Pieter Willem Herman DEJAGER , Heine Melle MULDER , Koen Jacobus Johannes ZAAL , Theodorus Petrus Maria CADEE , Danny Maria Hubertus PHILIPS , Ruud Antonius Catharina Maria BEERENS , Roger Anton Marie TIMMERMANS
- 申请人： ASML Netherlands B.V.
- 申请人地址： NL Veldhoven
- 专利权人： ASML Netherlands B.V.
- 当前专利权人： ASML Netherlands B.V.
- 当前专利权人地址： NL Veldhoven
- 主分类号： G03F7/20
- IPC分类号： G03F7/20
摘要：
A projection system, configured to project a radiation beam onto a target, includes a rotatable frame configured to rotate about an axis defining a tangential direction and a radial direction, wherein the rotatable frame holds a lens configured to focus the radiation beam in only the tangential or radial direction; and a stationary part comprising a substantially stationary lens configured to focus the radiation beam in only the other of the tangential or radial direction.
信息查询
IPC分类:
