公开(公告)号：US20160349628A1

公开(公告)日：2016-12-01

申请号：US15235542

申请日：2016-08-12

Applicant: ASML Netherlands B.V.

Inventor： Arno Jan BLEEKER ,  Thomas Josephus Maria CASTENMILLER ,  Pieter Willem Herman DEJAGER ,  Heine Melle MULDER ,  Koen Jacobus Johannes ZAAL ,  Theodorus Petrus Maria CADEE ,  Danny Maria Hubertus PHILIPS ,  Ruud Antonius Catharina Maria BEERENS ,  Roger Anton Marie TIMMERMANS

IPC: G03F7/20

CPC classification number: G03F7/70716 ,  G03F7/20 ,  G03F7/7005 ,  G03F7/70075 ,  G03F7/70275 ,  G03F7/70291 ,  G03F7/70366 ,  G03F7/70383 ,  G03F7/70391 ,  G03F7/704 ,  G03F7/70425 ,  G03F7/70475

Abstract: A projection system, configured to project a radiation beam onto a target, includes a rotatable frame configured to rotate about an axis defining a tangential direction and a radial direction, wherein the rotatable frame holds a lens configured to focus the radiation beam in only the tangential or radial direction; and a stationary part comprising a substantially stationary lens configured to focus the radiation beam in only the other of the tangential or radial direction.

Abstract translation: 配置成将辐射束投影到目标上的投影系统包括可旋转框架，其被配置为围绕限定切线方向和径向方向的轴线旋转，其中可旋转框架保持配置成将辐射束聚焦在仅切向 或径向; 以及固定部分，其包括基本上固定的透镜，其被配置为仅将所述辐射束聚焦在所述切向或径向方向中的另一个中。

公开(公告)号：US20190377267A1

公开(公告)日：2019-12-12

申请号：US16462742

申请日：2017-11-16

Applicant: ASML Netherlands B.V.

Inventor： Sumant Sukdew Ramanujan OEMRAWSINGH ,  Arno Jan BLEEKER ,  Alexander Matthijs STRUYCKEN ,  Engelbertus Antonius Fransiscus VAN DER PASCH ,  Bert Pieter VAN DRIEËNHUIZEN

IPC: G03F7/20 ,  G03F9/00 ,  G02B5/32

Abstract: An alignment system aligns a laser beam to a desired position in a reference plane and to a desired direction in the reference plane. The system diffracts the laser light into different diffraction orders that are projected onto a detection plane using different lenses. As the locations of the projections of the different diffraction orders in the detection plane respond differently to changes in position and in direction of the beam in the reference plane, the locations of the projections enable to determine how to adjust the beam so as to get the beam properly aligned. The diffraction and the projection can be implemented by a hologram.

公开(公告)号：US20140233025A1

公开(公告)日：2014-08-21

申请号：US14264547

申请日：2014-04-29

Applicant: ASML, Netherlands B.V.

Inventor： Arie Jeffrey Maria DEN BOEF ,  Arno Jan BLEEKER ,  Youri Johannes Laurentius Maria VAN DOMMELEN ,  Mircea DUSA ,  Antoine Gaston Marie KIERS ,  Paul Frank LUEHRMANN ,  Henricus Petrus Maria PELLEMANS ,  Maurits VAN DER SCHAAR ,  Cedric Desire GROUWSTRA ,  Markus Gerardus Martinus VAN KRAAIJ

IPC: G01N21/88

CPC classification number: G01N21/8806 ,  G03F7/70341 ,  G03F7/70633 ,  G03F7/7065 ,  G03F9/7034

Abstract: An apparatus and method to determine a property of a substrate by measuring, in the pupil plane of a high numerical aperture lens, an angle-resolved spectrum as a result of radiation being reflected off the substrate. The property may be angle and wavelength dependent and may include the intensity of TM- and TE-polarized radiation and their relative phase difference.

Abstract translation: 通过在高数值孔径透镜的光瞳平面中测量作为辐射的结果的角度分辨光谱从衬底反射来确定衬底的性质的装置和方法。 该属性可以是角度和波长相关的，并且可以包括TM和TE偏振辐射的强度及其相对相位差。

公开(公告)号：US20230154722A1

公开(公告)日：2023-05-18

申请号：US17361119

申请日：2019-12-17

Applicant: ASML Netherlands B.V.

Inventor： Arno Jan BLEEKER ,  Pieter Willem Herman DE JAGER ,  Maikel Robert GOOSEN ,  Erwin Paul SMAKMAN ,  Albertus Victor Gerardus MANGNUS ,  Yan REN ,  Adam LASSISE

IPC: H01J37/147 ,  H01J37/244 ,  H01J37/26 ,  H01J37/28

CPC classification number: H01J37/1474 ,  H01J37/244 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/2817 ,  H01J2237/2448 ,  H01J2237/24475

Abstract: Apparatuses and methods for charged-particle detection may include a deflector system configured to direct charged-particle pulses, a detector having a detection element configured to detect the charged-particle pulses, and a controller having a circuitry configured to control the deflector system to direct a first and second charged-particle pulses to the detection element; obtain first and second timestamps associated with when the first charged-particle pulse is directed by the deflector system and detected by the detection element, respectively, and third and fourth timestamps associated with when the second charged-particle pulse is directed by the deflector system and detected by the detection element, respectively; and identify a first and second exiting beams based on the first and second timestamps, and the third and fourth timestamps, respectively.

公开(公告)号：US20190170657A1

公开(公告)日：2019-06-06

申请号：US16270155

申请日：2019-02-07

Applicant: ASML Netherlands B.V.

Inventor： Arie Jeffrey Maria DEN BOEF ,  Arno Jan BLEEKER ,  Youri Johannes Laurentiu VAN DOMMELEN ,  Mircea DUSA ,  Antoine Gaston Marie KIERS ,  Paul Frank LUEHRMANN ,  Henricus Petrus Maria PELLEMANS ,  Maurits VAN DER SCHAAR ,  Cedric Desire GROUWSTRA ,  Markus Gerardus Martinus VAN KRAAIJ

IPC: G01N21/88 ,  G03F7/20 ,  G03F9/00

Abstract: An apparatus and method to determine a property of a substrate by measuring, in the pupil plane of a high numerical aperture lens, an angle-resolved spectrum as a result of radiation being reflected off the substrate. The property may be angle and wavelength dependent and may include the intensity of TM- and TE-polarized radiation and their relative phase difference.

公开(公告)号：US20180031979A1

公开(公告)日：2018-02-01

申请号：US15550855

申请日：2016-01-21

Applicant: ASML Netherlands B.V.

Inventor： Arno Jan BLEEKER ,  Ramon Mark HOFSTRA ,  Erik Petrus BUURMAN ,  Johannes Hubertus Josephina MOORS ,  Alexander Matthijs STRUYCKEN ,  Harm-Jan VOORMA ,  Sumant Sukdew Ramanujan OEMRAWSINGH ,  Markus Franciscus Antonius EURLINGS ,  Peter Frans Maria MUYS

IPC: G03F7/20 ,  H01S3/23 ,  H01S3/00 ,  H05G2/00 ,  G02B27/14

CPC classification number: G03F7/70033 ,  G02B27/141 ,  G03F7/70025 ,  G03F7/70566 ,  H01S3/0064 ,  H01S3/2308 ,  H01S3/2316 ,  H05G2/005 ,  H05G2/008

Abstract: A laser radiation source for a lithographic tool comprising a laser module to emit a first laser beam having a first wavelength and a second laser beam having a second wavelength, a beam separation device to separate the optical paths of the first and second laser beams and substantially recombine the optical paths, a beam delivery system to direct the first and second laser beams to a fuel target and an optical isolation apparatus to: adjust the polarization state of the first laser beam, adjust the polarization state of the second laser beam and to block radiation having the adjusted polarization states such that the reflection of the first laser beam and the reflection of the second laser beam are substantially blocked from propagating towards the laser module.