Invention Application
- Patent Title: INTEGRATED CIRCUIT DEVICE AND METHOD OF MANUFACTURING THE SAME
- Patent Title (中): 集成电路装置及其制造方法
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Application No.: US15053410Application Date: 2016-02-25
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Publication No.: US20160351472A1Publication Date: 2016-12-01
- Inventor: MYEONG-SOON PARK , HYUN-SOO CHUNG , CHAN-HO LEE
- Applicant: MYEONG-SOON PARK , HYUN-SOO CHUNG , CHAN-HO LEE
- Priority: KR10-2015-0075371 20150528
- Main IPC: H01L23/48
- IPC: H01L23/48 ; H01L23/00 ; H01L23/532 ; H01L25/065

Abstract:
An integrated circuit device is provided as follows. A connection terminal is disposed on a first surface of a semiconductor structure. A conductive pad is disposed on a second surface, opposite to the first surface, of the semiconductor structure. A through-substrate-via (TSV) structure penetrates through the semiconductor structure. An end portion of the TSV structure extends beyond the second surface of the semiconductor structure. The conductive pad surrounds the end portion of the TSV structure. The connection terminal is electrically connected to the conductive pad through the TSV structure
Information query
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