发明申请
- 专利标题: INTEGRATED CIRCUIT DEVICE AND METHOD OF MANUFACTURING THE SAME
- 专利标题(中): 集成电路装置及其制造方法
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申请号: US15053410申请日: 2016-02-25
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公开(公告)号: US20160351472A1公开(公告)日: 2016-12-01
- 发明人: MYEONG-SOON PARK , HYUN-SOO CHUNG , CHAN-HO LEE
- 申请人: MYEONG-SOON PARK , HYUN-SOO CHUNG , CHAN-HO LEE
- 优先权: KR10-2015-0075371 20150528
- 主分类号: H01L23/48
- IPC分类号: H01L23/48 ; H01L23/00 ; H01L23/532 ; H01L25/065
摘要:
An integrated circuit device is provided as follows. A connection terminal is disposed on a first surface of a semiconductor structure. A conductive pad is disposed on a second surface, opposite to the first surface, of the semiconductor structure. A through-substrate-via (TSV) structure penetrates through the semiconductor structure. An end portion of the TSV structure extends beyond the second surface of the semiconductor structure. The conductive pad surrounds the end portion of the TSV structure. The connection terminal is electrically connected to the conductive pad through the TSV structure
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