Invention Application
- Patent Title: Three Dimensional Monolithic LDMOS Transistor
- Patent Title (中): 三维单片LDMOS晶体管
-
Application No.: US14755625Application Date: 2015-06-30
-
Publication No.: US20160351710A1Publication Date: 2016-12-01
- Inventor: Qing Liu , Shom Ponoth
- Applicant: Broadcom Corporation
- Main IPC: H01L29/78
- IPC: H01L29/78 ; H01L29/417 ; H01L29/06 ; H01L29/08 ; H01L29/66 ; H01L23/535

Abstract:
A three dimensional monolithic LDMOS transistor implements a drain structure vertically disposed above a level of the structure that includes a drain connection of the transistor. Displacing the drain structure vertically, out of the plane or level of the gate and source/drain connections, creates a three dimensional structure for the transistor. One result is that the transistor consumes far less lateral area on the substrate. The reduction in lateral area in turn provides benefits such as allowing transistors to be more densely arranged on the substrate and allowing additional devices of other types to be formed on the substrate.
Public/Granted literature
- US09825141B2 Three dimensional monolithic LDMOS transistor Public/Granted day:2017-11-21
Information query
IPC分类: