发明申请
- 专利标题: WIRING SUBSTRATE AND METHOD OF MAKING WIRING SUBSTRATE
- 专利标题(中): 接线基板和接线基板的制作方法
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申请号: US15158777申请日: 2016-05-19
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公开(公告)号: US20160353569A1公开(公告)日: 2016-12-01
- 发明人: Jun FURUICHI , Noriyoshi SHIMIZU
- 申请人: SHINKO ELECTRIC INDUSTRIES CO., LTD.
- 优先权: JP2015-108812 20150528
- 主分类号: H05K1/02
- IPC分类号: H05K1/02 ; H05K3/46 ; H05K1/11
摘要:
A wiring substrate includes a core layer having a penetrating hole, a first insulating layer disposed on a first surface of the core layer and having a first opening at a position of the penetrating hole, the first insulating layer containing no filler, a penetrating electrode disposed in the penetrating hole and in the first opening, and a first wiring layer laminated both on the first insulating layer at a first surface thereof facing away from the core layer and on an end face of the penetrating electrode, wherein the first surface of the first insulating layer and the end face of the penetrating electrode are planarized.
公开/授权文献
- US09668341B2 Wiring substrate and method of making wiring substrate 公开/授权日:2017-05-30