Invention Application
US20160365288A1 DUMMY GATE USED AS INTERCONNECTION AND METHOD OF MAKING THE SAME
有权
用作互连的DUMMY GATE及其制造方法
- Patent Title: DUMMY GATE USED AS INTERCONNECTION AND METHOD OF MAKING THE SAME
- Patent Title (中): 用作互连的DUMMY GATE及其制造方法
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Application No.: US14737551Application Date: 2015-06-12
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Publication No.: US20160365288A1Publication Date: 2016-12-15
- Inventor: Wenhui WANG , Ryan Ryoung-han KIM , Linus JANG , Jason CANTONE , Lei SUN , Seowoo NAM
- Applicant: GLOBALFOUNDRIES Inc.
- Main IPC: H01L21/8238
- IPC: H01L21/8238 ; H01L23/528 ; H01L21/02 ; H01L27/092 ; H01L29/66 ; H01L29/06

Abstract:
Process of using a dummy gate as an interconnection and a method of manufacturing the same are disclosed. Embodiments include forming on a semiconductor substrate dummy gate structures at cell boundaries, each dummy gate structure including a set of sidewall spacers and a cap disposed between the sidewall spacers; removing a first sidewall spacer or at least a portion of a first cap on a first side of a first dummy gate structure and forming a first gate contact trench over the first dummy gate structure; and filling the first gate contact trench with a metal to form a first gate contact.
Public/Granted literature
- US09595478B2 Dummy gate used as interconnection and method of making the same Public/Granted day:2017-03-14
Information query
IPC分类: