发明申请
US20160379817A1 PERHYDROPOLYSILAZANE, COMPOSITION CONTAINING SAME, AND METHOD FOR FORMING SILICA FILM USING SAME
有权
PERHYDROOLYSILAZANE，包含它们的组合物和使用其形成二氧化硅膜的方法
- 专利标题： PERHYDROPOLYSILAZANE, COMPOSITION CONTAINING SAME, AND METHOD FOR FORMING SILICA FILM USING SAME
- 专利标题（中）： PERHYDROOLYSILAZANE，包含它们的组合物和使用其形成二氧化硅膜的方法
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申请号： US15039440申请日： 2014-12-08
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公开(公告)号： US20160379817A1公开(公告)日： 2016-12-29
- 发明人: Toshiya OKAMURA , Takashi KANDA , Issei SAKURAI , Bertram Bernd BARNICKEL , Hiroyuki AOKI
- 申请人： AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.I.
- 优先权： JP2013-254456 20131209
- 国际申请： PCT/JP2014/082468 WO 20141208
- 主分类号： H01L21/02
- IPC分类号： H01L21/02 ; C09D1/00 ; C01B21/087
摘要：
[Problem] To provide a perhydropolysilazane making it possible to form a siliceous film with minimal defects, and a curing composition comprising the perhydropolysilazane.[Means for Solution] The present invention provides a perhydropolysilazane having a weight-average molecular weight of 5,000 to 17,000, characterized in that when 1H-NMR of a 17% by weight solution of said perhydropolysilazane dissolved in xylol is measured, the ratio of the amount of SiH1,2 based on the aromatic ring hydrogen content of the xylol is 0.235 or less and the ratio of the amount of NH based on the aromatic ring hydrogen content of the xylol is 0.055 or less, and a curing composition comprising the perhydropolysilazane. The present invention also provides a method for forming a siliceous film, comprising coating the curing composition on a substrate and heating.
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