公开(公告)号：US20160379817A1

公开(公告)日：2016-12-29

申请号：US15039440

申请日：2014-12-08

申请人： AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.I.

发明人： Toshiya OKAMURA ,  Takashi KANDA ,  Issei SAKURAI ,  Bertram Bernd BARNICKEL ,  Hiroyuki AOKI

IPC分类号： H01L21/02 ,  C09D1/00 ,  C01B21/087

CPC分类号： H01L21/02222 ,  C01B21/087 ,  C08G77/62 ,  C09D1/00 ,  H01L21/02164 ,  H01L21/02282

摘要： [Problem] To provide a perhydropolysilazane making it possible to form a siliceous film with minimal defects, and a curing composition comprising the perhydropolysilazane.[Means for Solution] The present invention provides a perhydropolysilazane having a weight-average molecular weight of 5,000 to 17,000, characterized in that when 1H-NMR of a 17% by weight solution of said perhydropolysilazane dissolved in xylol is measured, the ratio of the amount of SiH1,2 based on the aromatic ring hydrogen content of the xylol is 0.235 or less and the ratio of the amount of NH based on the aromatic ring hydrogen content of the xylol is 0.055 or less, and a curing composition comprising the perhydropolysilazane. The present invention also provides a method for forming a siliceous film, comprising coating the curing composition on a substrate and heating.

摘要翻译： [解决方案]本发明提供重均分子量为5,000〜17,000的全氢聚硅氮烷，其特征在于，测定17重量％的所述全氢聚硅氮烷溶解在二甲苯中的溶液的1H-NMR， 基于二甲苯的芳环氢含量的SiH1.2的量为0.235或更小，并且基于二羟甲基的芳环氢含量的NH的量的比例为0.055或更小，以及包含全氢聚硅氮烷的固化组合物。 本发明还提供一种形成硅质膜的方法，其包括将固化组合物涂覆在基材上并加热。