Invention Application
US20160379872A1 METHOD TO PROTECT MOL METALLIZATION FROM HARDMASK STRIP PROCESS
有权
从HARDMASK条纹过程中保护金属化的方法
- Patent Title: METHOD TO PROTECT MOL METALLIZATION FROM HARDMASK STRIP PROCESS
- Patent Title (中): 从HARDMASK条纹过程中保护金属化的方法
-
Application No.: US14752210Application Date: 2015-06-26
-
Publication No.: US20160379872A1Publication Date: 2016-12-29
- Inventor: Vimal KAMINENI , Nicholas Vincent LICAUSI , Shariq SIDDIQUI , Jeremy Austin WAHL
- Applicant: GLOBALFOUNDRIES Inc.
- Applicant Address: KY Grand Cayman
- Assignee: GLOBALFOUNDRIES INC.
- Current Assignee: GLOBALFOUNDRIES INC.
- Current Assignee Address: KY Grand Cayman
- Main IPC: H01L21/768
- IPC: H01L21/768 ; H01L23/535
Abstract:
A method can include forming a contact trench in a semiconductor structure so that the contact trench extends to a contact formation, the forming including using a hardmask layer, and filling the contact trench with a sacrificial material layer, the sacrificial material layer formed over the contact formation. A semiconductor structure can include a sacrificial material layer over a contact formation.
Public/Granted literature
- US09570344B2 Method to protect MOL metallization from hardmask strip process Public/Granted day:2017-02-14
Information query
IPC分类:
