Invention Application
- Patent Title: CO2 REMOVAL DEVICE
- Patent Title (中): 二氧化碳去除装置
-
Application No.: US15301099Application Date: 2015-07-08
-
Publication No.: US20170014750A1Publication Date: 2017-01-19
- Inventor: Kouhei YOSHIKAWA , Masato KANEEDA , Hidehiro NAKAMURA , Toshiaki SHIRASAKA
- Applicant: HITACHI CHEMICAL COMPANY, LTD.
- Applicant Address: JP Tokyo
- Assignee: HITACHI CHEMICAL COMPANY, LTD.
- Current Assignee: HITACHI CHEMICAL COMPANY, LTD.
- Current Assignee Address: JP Tokyo
- Priority: JP2014-141002 20140709
- International Application: PCT/JP2015/069584 WO 20150708
- Main IPC: B01D53/04
- IPC: B01D53/04 ; B01D53/82 ; B01D53/26 ; B01J38/02 ; B01D53/96 ; B01D53/047 ; B01J20/06 ; B01J20/18 ; B01D53/62 ; B01D53/34

Abstract:
A CO2 removal device includes: a CO2 capturing material which captures H2O and CO2 in a gas; a reaction container which contains the CO2 capturing material; an H2O measuring unit for measuring the concentration of H2O in the gas; an H2O concentration adjustment device which adjusts the concentration of H2O on the basis of information obtained by the H2O measuring unit; a gas introduction path introducing the gas into the reaction container from the H2O concentration adjustment device and bringing the gas into contact with the CO2 capturing material; a first gas discharge path discharging the gas from the reaction container after the gas has been brought into contact with the CO2 capturing material; and a second gas discharge path discharging the gas that has been desorbed from the CO2 capturing material from the reaction container. The CO2 removal device allows for the reduction of energy consumption in removing CO2.
Public/Granted literature
- US10035099B2 CO2 removal device Public/Granted day:2018-07-31
Information query
IPC分类: