Invention Application
US20170025140A1 APPARATUS AND METHODS FOR ALIGNED SERVO-RELATED FEATURES 有权
对准伺服相关特征的装置和方法

APPARATUS AND METHODS FOR ALIGNED SERVO-RELATED FEATURES
Abstract:
Provided herein is an apparatus, including a first region of a substrate corresponding to a data region in a patterned recording medium; a first set of protrusions etched out of the first region of the substrate, wherein the protrusions of the first set of protrusions are rectangle shaped; a second region of the substrate corresponding to a servo region in a patterned recording medium; and a second set of protrusions etched out of the second region of the substrate, wherein the second set of protrusions includes radial lines etched into the substrate across chevrons etched out of the substrate.
Public/Granted literature
Information query
Patent Agency Ranking
0/0