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公开(公告)号：US20170125049A1
公开(公告)日：2017-05-04
申请号：US15403040
申请日：2017-01-10
Applicant: Seagate Technology LLC
Inventor： Shuaigang Xiao , David S. Kuo , XiaoMin Yang , Kim Y. Lee , Yautzong Hsu , Koichi Wago
CPC classification number: G11B5/59638 , G11B5/59655 , G11B5/746 , G11B5/84 , G11B5/855 , G11B20/1217 , G11B2020/1281
Abstract: Provided herein is a method, including creating a first pattern in a data region of a substrate, and creating a second pattern in a servo region of a substrate. A circumferential line pattern is created overlapping the first pattern to create rectangle-shaped protrusions in the data region of the substrate. A chevron pattern is created overlapping the second pattern to create chevron-derived protrusions in the servo region of the substrate.
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公开(公告)号：US09620161B2
公开(公告)日：2017-04-11
申请号：US14824995
申请日：2015-04-16
Applicant: Seagate Technology LLC
Inventor： Shuaigang Xiao , David S. Kuo , XiaoMin Yang , Kim Y. Lee , Yautzong Hsu , Koichi Wago
CPC classification number: G11B5/59638 , G11B5/59655 , G11B5/746 , G11B5/84 , G11B5/855 , G11B20/1217 , G11B2020/1281
Abstract: Provided herein is an apparatus, including a first region of a substrate corresponding to a data region in a patterned recording medium; a first set of protrusions etched out of the first region of the substrate, wherein the protrusions of the first set of protrusions are rectangle shaped; a second region of the substrate corresponding to a servo region in a patterned recording medium; and a second set of protrusions etched out of the second region of the substrate, wherein the second set of protrusions includes radial lines etched into the substrate across chevrons etched out of the substrate.
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公开(公告)号：US20160181102A1
公开(公告)日：2016-06-23
申请号：US15055303
申请日：2016-02-26
Applicant: Seagate Technology LLC
Inventor： XiaoMin Yang , Shuaigang Xiao , Yautzong Hsu , Zhaoning Yu , Kim Y. Lee , David S. Kuo
IPC: H01L21/033
CPC classification number: H01L21/0338 , G03F7/0002 , G11B5/746 , H01L21/0332 , H01L21/0335 , H01L21/0337
Abstract: Provided is an apparatus that includes a substrate; a first hard-mask pattern that includes a number of first features disposed over a top surface of the substrate; and a second hard-mask pattern disposed over the first hard-mask layer. The second hard-mask pattern includes a number of second features overlapping one or more of the first features.
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公开(公告)号：US09928867B2
公开(公告)日：2018-03-27
申请号：US14728908
申请日：2015-06-02
Applicant: Seagate Technology LLC
Inventor： Shuaigang Xiao , XiaoMin Yang , ZhaoNing Yu , Yautzong Hsu
IPC: G11B5/855 , G11B5/74 , H01L21/00 , H01L21/302 , G03F7/00
CPC classification number: G11B5/855 , G03F7/0002 , G11B5/746 , H01L21/00 , H01L21/302 , Y10T428/24802 , Y10T428/24926
Abstract: Provided herein are apparatuses and methods, including patterning a first set of features in a servo zone to form a patterned servo zone while a first mask protects a data zone from the patterning. The first mask may be removed from the data zone. The apparatuses and methods may further include patterning a second set of features in the data zone to form a patterned data zone while a second mask protects the patterned servo zone from the patterning.
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公开(公告)号：US20130186856A1
公开(公告)日：2013-07-25
申请号：US13798087
申请日：2013-03-13
Applicant: SEAGATE TECHNOLOGY LLC
Inventor： Shuaigang Xiao , XiaoMin Yang , Yuatzong Hsu , HongYing Wang , Kim Lee
CPC classification number: B05D3/107 , B05C21/005 , B05D3/007 , G03F7/20 , G11B5/746 , G11B5/855 , H01L21/02112 , H01L21/3065 , Y10T428/24802
Abstract: The embodiments disclose a method of fabricating servo integrated templates including depositing a protective layer on servo zone resist layer patterns, patterning integrated data zone features into a substrate, depositing a protective layer on data zones and removing the servo zone protective layer and patterning integrated servo zone features into the substrate and removing the data zone protective layer creating a substrate template used in fabricating data and servo zone integrated patterned stacks.
Abstract translation: 这些实施例公开了一种制造伺服集成模板的方法，包括在伺服区抗蚀剂层图案上沉积保护层，将集成的数据区特征图案化成衬底，在数据区上沉积保护层并移除伺服区保护层， 特征进入衬底并移除数据区保护层，形成用于制造数据和伺服区集成图案化堆叠的衬底模板。
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Patent Agency Ranking
6.发明申请METHOD OF FABRICATING A BPM TEMPLATE USING HIERARCHICAL BCP DENSITY PATTERNS 审中-公开使用分层BCP密度模式制作BPM模板的方法公开(公告)号：US20170025141A1
公开(公告)日：2017-01-26
申请号：US15289884
申请日：2016-10-10
Applicant: Seagate Technology LLC
Inventor： XiaoMin Yang , Shuaigang Xiao , Kim Y. Lee , Koichi Wago , Philip Steiner
CPC classification number: G11B5/746 , G03F7/0002 , G11B5/855
Abstract: The embodiments disclose a method including patterning a template substrate to have different densities using hierarchical block copolymer density patterns in different zones including a first pattern and a second pattern, using a first directed self-assembly to pattern a first zone in the substrate using a first block copolymer material, and using a second directed self-assembly to pattern a second zone in the substrate using a second block copolymer material.
Abstract translation: 实施方案公开了一种方法，其包括使用第一定向自组装使用第一和第二图案在第一图案和第二图案中分层嵌段共聚物密度图案在不同区域中图案化模板基底以具有不同的密度，以使用第一 嵌段共聚物材料，并且使用第二定向自组装来使用第二嵌段共聚物材料在基材中图案化第二区域。
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7.发明授权公开(公告)号：US09269388B2
公开(公告)日：2016-02-23
申请号：US14673471
申请日：2015-03-30
Applicant: Seagate Technology LLC
Inventor： Shuaigang Xiao , XiaoMin Yang
IPC: G11B5/84 , B05D5/00 , B05D1/32 , B05D3/06 , B81C1/00 , B82Y10/00 , G11B5/74 , G11B5/82 , G11B5/855 , G11B5/596 , B05D3/00
CPC classification number: G11B5/84 , B05D1/322 , B05D3/00 , B05D3/06 , B05D5/00 , B81C1/00031 , B81C2201/0149 , B82Y10/00 , G03F7/0002 , G11B5/59633 , G11B5/743 , G11B5/746 , G11B5/82 , G11B5/855 , Y10T428/24802
Abstract: A substrate having an arrangement of self-assembling magnetic domains and a method of fabrication therefor. In some embodiments, a substrate is patterned with a plurality of chemically contrasted alignment features, and a block copolymer having a magnetic component and a non-magnetic component is deposited onto the substrate. The block copolymer self-assembles into a sequence of magnetic domains responsive to the alignment features. The period of the alignment features is between about 2 times and about 10 times the period of the magnetic domains.
Abstract translation: 具有自组装磁畴布置的基板及其制造方法。 在一些实施例中，用多个化学对比的对准特征图案化基底，并且将具有磁性成分和非磁性成分的嵌段共聚物沉积在基底上。 嵌段共聚物自组装成响应于对准特征的一系列磁畴。 对准特征的周期是磁畴周期的约2倍至约10倍。
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公开(公告)号：US20150262606A1
公开(公告)日：2015-09-17
申请号：US14728908
申请日：2015-06-02
Applicant: Seagate Technology LLC
Inventor： Shuaigang Xiao , XiaoMin Yang , ZhaoNing Yu , Yautzong Hsu
CPC classification number: G11B5/855 , G03F7/0002 , G11B5/746 , H01L21/00 , H01L21/302 , Y10T428/24802 , Y10T428/24926
Abstract: Provided herein are apparatuses and methods, including patterning a first set of features in a servo zone to form a patterned servo zone while a first mask protects a data zone from the patterning. The first mask may be removed from the data zone. The apparatuses and methods may further include patterning a second set of features in the data zone to form a patterned data zone while a second mask protects the patterned servo zone from the patterning.
Abstract translation: 本文提供了装置和方法，包括在伺服区中图形化第一组特征以形成图案化的伺服区，而第一掩模保护数据区免受图案化。 可以从数据区域中删除第一个掩码。 装置和方法还可以包括在数据区中图形化第二组特征以形成图案化数据区，而第二掩模保护图案化的伺服区免受图案化。
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9.发明申请Chemical Pinning to Direct Addressable Array Using Self-Assembling Materials 有权使用自组装材料进行直接寻址阵列的化学定位公开(公告)号：US20150206549A1
公开(公告)日：2015-07-23
申请号：US14673471
申请日：2015-03-30
Applicant: Seagate Technology LLC
Inventor： Shuaigang Xiao , XiaoMin Yang
CPC classification number: G11B5/84 , B05D1/322 , B05D3/00 , B05D3/06 , B05D5/00 , B81C1/00031 , B81C2201/0149 , B82Y10/00 , G03F7/0002 , G11B5/59633 , G11B5/743 , G11B5/746 , G11B5/82 , G11B5/855 , Y10T428/24802
Abstract: A substrate having an arrangement of self-assembling magnetic domains and a method of fabrication therefor. In some embodiments, a substrate is patterned with a plurality of chemically contrasted alignment features, and a block copolymer having a magnetic component and a non-magnetic component is deposited onto the substrate. The block copolymer self-assembles into a sequence of magnetic domains responsive to the alignment features. The period of the alignment features is between about 2 times and about 10 times the period of the magnetic domains.
Abstract translation: 具有自组装磁畴布置的基板及其制造方法。 在一些实施例中，用多个化学对比的对准特征图案化基底，并且将具有磁性成分和非磁性成分的嵌段共聚物沉积在基底上。 嵌段共聚物自组装成响应于对准特征的一系列磁畴。 对准特征的周期是磁畴周期的约2倍至约10倍。
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公开(公告)号：US09837274B2
公开(公告)日：2017-12-05
申请号：US15055303
申请日：2016-02-26
Applicant: Seagate Technology LLC
Inventor： XiaoMin Yang , Shuaigang Xiao , Yautzong Hsu , Zhaoning Yu , Kim Y. Lee , David S. Kuo
IPC: H01L21/00 , H01L21/033 , G03F7/00 , G11B5/74
CPC classification number: H01L21/0338 , G03F7/0002 , G11B5/746 , H01L21/0332 , H01L21/0335 , H01L21/0337
Abstract: Provided is an apparatus that includes a substrate; a first hard-mask pattern that includes a number of first features disposed over a top surface of the substrate; and a second hard-mask pattern disposed over the first hard-mask layer. The second hard-mask pattern includes a number of second features overlapping one or more of the first features.
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