Invention Application
- Patent Title: SEMICONDUCTOR DEVICE
- Patent Title (中): 半导体器件
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Application No.: US15293805Application Date: 2016-10-14
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Publication No.: US20170033152A1Publication Date: 2017-02-02
- Inventor: Hiroyuki MOMONO
- Applicant: Renesas Electronics Corporation
- Applicant Address: JP Kawasaki-shi
- Assignee: Renesas Electronics Corporation
- Current Assignee: Renesas Electronics Corporation
- Current Assignee Address: JP Kawasaki-shi
- Priority: JP2012-258646 20121127
- Main IPC: H01L27/146
- IPC: H01L27/146 ; G06F17/50 ; H01L21/66

Abstract:
A mask includes a substrate, an effective pixel formation region and a reference pattern formation region. A pixel pattern for forming a pixel component that constitutes a pixel is arranged in the effective pixel formation region. A reference pattern for indicating a reference position where pixel pattern should be arranged in the effective pixel formation region is arranged in the reference pattern formation region. Pixel pattern is arranged to be displaced from the reference position toward a center side of the effective pixel formation region.
Public/Granted literature
- US09825084B2 Semiconductor device Public/Granted day:2017-11-21
Information query
IPC分类: