Invention Application
- Patent Title: SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME
- Patent Title (中): 半导体器件及其制造方法
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Application No.: US15292530Application Date: 2016-10-13
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Publication No.: US20170033232A1Publication Date: 2017-02-02
- Inventor: Junichiro SAKATA , Takuya HIROHASHI , Hideyuki KISHIDA
- Applicant: Semiconductor Energy Laboratory Co., Ltd.
- Priority: JP2009-053399 20090306
- Main IPC: H01L29/786
- IPC: H01L29/786 ; H01L21/02 ; H01L29/66 ; H01L27/12 ; H01L29/423 ; H01L29/24

Abstract:
It is an object to provide a highly reliable semiconductor device including a thin film transistor with stable electric characteristics. In a semiconductor device including an inverted staggered thin film transistor whose semiconductor layer is an oxide semiconductor layer, a buffer layer is provided over the oxide semiconductor layer. The buffer layer is in contact with a channel formation region of the semiconductor layer and source and drain electrode layers. A film of the buffer layer has resistance distribution. A region provided over the channel formation region of the semiconductor layer has lower electrical conductivity than the channel formation region of the semiconductor layer, and a region in contact with the source and drain electrode layers has higher electrical conductivity than the channel formation region of the semiconductor layer.
Public/Granted literature
- US09991396B2 Semiconductor device and method for manufacturing the same Public/Granted day:2018-06-05
Information query
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