Invention Application
US20170048972A1 TRANSPARENT ELECTRODE USING AMORPHOUS ALLOY AND METHOD OF MANUFACTURING THE SAME
审中-公开
使用非晶态合金的透明电极及其制造方法
- Patent Title: TRANSPARENT ELECTRODE USING AMORPHOUS ALLOY AND METHOD OF MANUFACTURING THE SAME
- Patent Title (中): 使用非晶态合金的透明电极及其制造方法
-
Application No.: US15175510Application Date: 2016-06-07
-
Publication No.: US20170048972A1Publication Date: 2017-02-16
- Inventor: Eun-soo PARK , Keum-hwan PARK , Ju-ho LEE , Jin-man PARK , Young-soo LEE
- Applicant: SAMSUNG ELECTRONICS CO., LTD.
- Applicant Address: KR Suwon-si
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR Suwon-si
- Priority: KR10-2015-0112679 20150810
- Main IPC: H05K1/02
- IPC: H05K1/02 ; H05K3/06 ; H05K3/46 ; H05K1/03 ; H05K1/09
Abstract:
A transparent electrode using an amorphous alloy is provided. The transparent electrode includes a flexible substrate and an amorphous alloy layer configured to have conductivity and to be formed on the flexible substrate so as to have a plurality of voids.
Public/Granted literature
- US10070515B2 Transparent electrode using amorphous alloy and method of manufacturing the same Public/Granted day:2018-09-04
Information query
