Invention Application
- Patent Title: APPARATUS AND METHOD FOR GENERATING HIGH CURRENT NEGATIVE HYDROGEN ION BEAM
- Patent Title (中): 用于产生高电流负氢离子束的装置和方法
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Application No.: US14831468Application Date: 2015-08-20
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Publication No.: US20170053776A1Publication Date: 2017-02-23
- Inventor: W. Davis Lee , Neil Bassom , Anthony Renau
- Applicant: Varian Semiconductor Equipment Associates, Inc.
- Main IPC: H01J37/08
- IPC: H01J37/08 ; H01J37/317

Abstract:
An apparatus to generate negative hydrogen ions. The apparatus may include an ion source chamber having a gas inlet to receive H2 gas; a light source directing radiation into the ion source chamber to generate excited H2 molecules having an excited vibrational state from at least some of the H2 gas; a low energy electron source directing low energy electrons into the ion source chamber, wherein H− ions are generated from at least some of the excited H2 molecules; and an extraction assembly arranged to extract the H− ions from the ion source chamber.
Public/Granted literature
- US09773636B2 Apparatus and method for generating high current negative hydrogen ion beam Public/Granted day:2017-09-26
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