发明申请
US20170058079A1 POLYMER COMPOUND, RADIATION SENSITIVE COMPOSITION AND PATTERN FORMING METHOD
审中-公开
聚合物化合物,辐射敏感组合物和图案形成方法
- 专利标题: POLYMER COMPOUND, RADIATION SENSITIVE COMPOSITION AND PATTERN FORMING METHOD
- 专利标题(中): 聚合物化合物,辐射敏感组合物和图案形成方法
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申请号: US15151131申请日: 2016-05-10
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公开(公告)号: US20170058079A1公开(公告)日: 2017-03-02
- 发明人: Hiroto KUDO , Masatoshi ECHIGO , Takumi TOIDA , Takashi SATO
- 申请人: A School Corporation Kansai University , Mitsubishi Gas Chemical Company, Inc.
- 优先权: JP2015-165308 20150824; JP2015-220610 20151110; JP2016-091799 20160428
- 主分类号: C08G63/668
- IPC分类号: C08G63/668 ; G03F7/32 ; G03F7/20 ; G03F7/038 ; G03F7/16
摘要:
A polymer compound including a unit structure represented by the general formula (1): wherein m1 and m2 each equal 1 to 8, n1 and n2 each equal 0 to 7, m1+n1 and m2+n2 each equal 4 to 8, y represents 0 to 2, R1 represents a hydroxy group; a substituted or unsubstituted straight, branched or cyclic alkyl group; a substituted or unsubstituted aryl group, or a halogen atom, R3 represents a hydrogen atom, a substituted or unsubstituted straight, branched or cyclic alkyl group, or a substituted or unsubstituted aryl group, R2 represents any structure represented by general formula (2) in the specification, at least one R2 has an acid-dissociable site, R5 represents a hydroxy group, —O—R2—O—* or —O—R2—O—R55, and R6 represents a hydroxy group or —O—R2—O—*.
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