Invention Application
- Patent Title: Methods for Forming a Patterned Structure in a Sensor
- Patent Title (中): 在传感器中形成图形结构的方法
-
Application No.: US14839572Application Date: 2015-08-28
-
Publication No.: US20170060292A1Publication Date: 2017-03-02
- Inventor: Po-Jui Chen , Soyoung Kim , Kuo-Hua Sung , Hui Chen , Rui Qiao
- Applicant: Apple Inc.
- Main IPC: G06F3/044
- IPC: G06F3/044
Abstract:
A sensor includes a patterned compliant layer positioned between two substrates. Each substrate can include one or more conductive electrodes, with each electrode of one substrate paired with a respective electrode of the other substrate. Each pair of conductive electrodes forms a capacitor. Several methods are disclosed that can be used to produce the patterned compliant layer.
Public/Granted literature
- US09891770B2 Methods for forming a patterned structure in a sensor Public/Granted day:2018-02-13
Information query
