Invention Application
- Patent Title: METHOD OF PATTERNING GRAPHENE HOLES AND METHOD OF FABRICATING GRAPHENE TRANSPARENT ELECTRODE BY USING PULSE LASER
- Patent Title (中): 石墨孔的方法和使用脉冲激光制作石墨透明电极的方法
-
Application No.: US15065488Application Date: 2016-03-09
-
Publication No.: US20170064839A1Publication Date: 2017-03-02
- Inventor: Jeongyub LEE , Yunsung Woo , Changseung LEE , Eunhyoung CHO
- Applicant: Samsung Electronics Co., Ltd.
- Priority: KR10-2015-0121033 20150827
- Main IPC: H05K3/02
- IPC: H05K3/02 ; B23K26/384 ; B23K26/0622 ; H05K3/18
Abstract:
A method of patterning holes includes placing a substrate on a stage of a laser system, the substrate having a graphene layer on a surface thereof, generating a pulse laser from the laser system, and forming a plurality of hole patterns spaced apart from each other on the graphene layer by irradiating the pulse laser while the graphene layer is in motion.
Public/Granted literature
Information query
