Invention Application
US20170066014A1 RELEASE HOLE PLUS CONTACT VIA FOR FINE PITCH ULTRASOUND TRANSDUCER INTEGRATION
审中-公开
通过超声波超声波传感器集成来释放孔加入
- Patent Title: RELEASE HOLE PLUS CONTACT VIA FOR FINE PITCH ULTRASOUND TRANSDUCER INTEGRATION
- Patent Title (中): 通过超声波超声波传感器集成来释放孔加入
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Application No.: US15254593Application Date: 2016-09-01
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Publication No.: US20170066014A1Publication Date: 2017-03-09
- Inventor: Donald William Kidwell, JR. , Ravindra Shenoy , Jon Lasiter
- Applicant: QUALCOMM Incorporated
- Main IPC: B06B1/02
- IPC: B06B1/02 ; H01L41/332 ; B81B7/04 ; B06B1/06 ; B81C1/00 ; B81B3/00

Abstract:
Methods, systems, computer-readable media, and apparatuses for high density Micro-Electro-Mechanical Systems (MEMS) are presented. In some embodiments, a method for manufacturing a micro-electro-mechanical device on a substrate can comprise etching a release via through a layer of the device. The method can further comprise creating a cavity in the layer of the device using the release via as a conduit to access the desired location of the cavity, the cavity enabling movement of a transducer of the device. The method can then comprise depositing low impedance, electrically conductive material into the release via to form an electrically conductive path through the layer. Finally, the method can comprise electrically coupling the electrically conductive material to an electrode of the transducer.
Public/Granted literature
- US10722918B2 Release hole plus contact via for fine pitch ultrasound transducer integration Public/Granted day:2020-07-28
Information query
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