发明申请
- 专利标题： LITHOGRAPHIC APPARATUS
- 专利标题（中）： LITHOGRAPHIC设备
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申请号： US15354821申请日： 2016-11-17
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公开(公告)号： US20170068175A1公开(公告)日： 2017-03-09
- 发明人: Jan Steven Christiaan WESTERLAKEN , Ruud Hendrikus Martinus Johannes BLOKS , Peter A. DELMASTRO , Thibault Simon Mathieu LAURENT , Martinus Hendrikus Antonius LEENDERS , Mark Josef SCHUSTER , Christopher Charles WARD , Frank Johannes Jacobus VAN BOXTEL , Justin Matthew VERDIRAME , Samir A. NAYFEH
- 申请人： ASML NETHERLANDS B.V. , ASML HOLDING N.V.
- 申请人地址： NL Veldhoven NL Veldhoven
- 专利权人： ASML NETHERLANDS B.V.,ASML HOLDING N.V.
- 当前专利权人： ASML NETHERLANDS B.V.,ASML HOLDING N.V.
- 当前专利权人地址： NL Veldhoven NL Veldhoven
- 主分类号： G03F7/20
- IPC分类号： G03F7/20
摘要：
A lithographic apparatus has a support structure configured to support a patterning device, the patterning device serving to pattern a radiation beam according to a desired pattern and having a planar main surface through which the radiation beam passes; an outlet opening configured to direct a flow of a gas onto the patterning device; and an inlet opening configured to extract the gas which has exited the outlet opening, wherein the outlet opening and inlet opening are in a facing surface facing the planar main surface of the patterning device.
公开/授权文献
- US10788763B2 Lithographic apparatus 公开/授权日：2020-09-29
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