Invention Application
- Patent Title: LITHOGRAPHIC APPARATUS
- Patent Title (中): LITHOGRAPHIC设备
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Application No.: US15354821Application Date: 2016-11-17
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Publication No.: US20170068175A1Publication Date: 2017-03-09
- Inventor: Jan Steven Christiaan WESTERLAKEN , Ruud Hendrikus Martinus Johannes BLOKS , Peter A. DELMASTRO , Thibault Simon Mathieu LAURENT , Martinus Hendrikus Antonius LEENDERS , Mark Josef SCHUSTER , Christopher Charles WARD , Frank Johannes Jacobus VAN BOXTEL , Justin Matthew VERDIRAME , Samir A. NAYFEH
- Applicant: ASML NETHERLANDS B.V. , ASML HOLDING N.V.
- Applicant Address: NL Veldhoven NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.,ASML HOLDING N.V.
- Current Assignee: ASML NETHERLANDS B.V.,ASML HOLDING N.V.
- Current Assignee Address: NL Veldhoven NL Veldhoven
- Main IPC: G03F7/20
- IPC: G03F7/20
Abstract:
A lithographic apparatus has a support structure configured to support a patterning device, the patterning device serving to pattern a radiation beam according to a desired pattern and having a planar main surface through which the radiation beam passes; an outlet opening configured to direct a flow of a gas onto the patterning device; and an inlet opening configured to extract the gas which has exited the outlet opening, wherein the outlet opening and inlet opening are in a facing surface facing the planar main surface of the patterning device.
Public/Granted literature
- US10788763B2 Lithographic apparatus Public/Granted day:2020-09-29
Information query
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