公开(公告)号：US20170068175A1

公开(公告)日：2017-03-09

申请号：US15354821

申请日：2016-11-17

Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

Inventor： Jan Steven Christiaan WESTERLAKEN ,  Ruud Hendrikus Martinus Johannes BLOKS ,  Peter A. DELMASTRO ,  Thibault Simon Mathieu LAURENT ,  Martinus Hendrikus Antonius LEENDERS ,  Mark Josef SCHUSTER ,  Christopher Charles WARD ,  Frank Johannes Jacobus VAN BOXTEL ,  Justin Matthew VERDIRAME ,  Samir A. NAYFEH

IPC: G03F7/20

Abstract: A lithographic apparatus has a support structure configured to support a patterning device, the patterning device serving to pattern a radiation beam according to a desired pattern and having a planar main surface through which the radiation beam passes; an outlet opening configured to direct a flow of a gas onto the patterning device; and an inlet opening configured to extract the gas which has exited the outlet opening, wherein the outlet opening and inlet opening are in a facing surface facing the planar main surface of the patterning device.

Abstract translation: 光刻设备具有构造成支撑图案形成装置的支撑结构，所述图案形成装置用于根据期望的图案对辐射束进行图案化，并具有辐射束通过的平面主表面; 出口开口，其构造成将气体流引导到图案形成装置上; 以及入口开口，被配置为提取已经离开出口的气体，其中出口开口和入口开口面向面向图案形成装置的平面主表面的面对表面。

公开(公告)号：US20170160652A1

公开(公告)日：2017-06-08

申请号：US15438376

申请日：2017-02-21

Applicant: ASML Holding N.V. ,  ASML Netherlands B.V.

Inventor： Earl William EBERT ,  Johannes ONVLEE ,  Samir A. NAYFEH ,  Mark Josef SCHUSTER ,  Peter A. DELMASTRO ,  Christopher Charles WARD ,  Frank Johannes Jacobus VAN BOXTEL ,  Abdullah ALIKHAN ,  Daniel Nathan BURBANK ,  Daniel Nicholas GALBURT ,  Justin Matthew VERDIRAME

IPC: G03F7/20

CPC classification number: G03F7/70875 ,  G03F7/70341 ,  G03F7/70716 ,  G03F7/70808 ,  G03F7/70858 ,  G03F7/70866

Abstract: A patterning device support for controlling a temperature of a patterning device can include a movable component. The movable component can include a gas inlet for supplying a gas flow across a surface of the patterning device and a gas outlet for extracting the gas flow. The patterning device support can also include a gas flow generator coupled to a duct, for recirculating the gas flow from the gas outlet to the gas inlet.

公开(公告)号：US20170307986A1

公开(公告)日：2017-10-26

申请号：US15649161

申请日：2017-07-13

Applicant: ASML Holding N.V. ,  ASML Netherlands B.V.

Inventor： Earl William EBERT ,  Johannes ONVLEE ,  Samir A. NAYFEH ,  Mark Josef SCHUSTER ,  Peter A. DELMASTRO ,  Christopher Charles WARD ,  Frank Johannes Jacobus VAN BOXTEL ,  Abdullah ALIKHAN ,  Daniel Nathan BURBANK ,  Daniel Nicholas GALBURT ,  Justin Matthew VERDIRAME

IPC: G03F7/20

CPC classification number: G03F7/70875 ,  G03F7/70341 ,  G03F7/70716 ,  G03F7/70808 ,  G03F7/70858 ,  G03F7/70866

Abstract: A patterning device support for controlling a temperature of a patterning device can include a movable component. The movable component can include a gas inlet for supplying a gas flow across a surface of the patterning device and a gas outlet for extracting the gas flow. The patterning device support can also include a gas flow generator coupled to a duct, for recirculating the gas flow from the gas outlet to the gas inlet.

公开(公告)号：US20150241796A1

公开(公告)日：2015-08-27

申请号：US14699468

申请日：2015-04-29

Applicant: ASML Holding N.V. ,  ASML Netherlands B.V.

Inventor： Earl William EBERT, JR. ,  Johannes ONVLEE ,  Samir A. NAYFEH ,  Mark Josef SCHUSTER ,  Peter A. DELMASTRO ,  Christopher Charles WARD ,  Frank Johannes Jacobus VAN BOXTEL ,  Abdullah ALIKHAN ,  Daniel Nathan BURBANK ,  Daniel Nicholas GALBURT ,  Justin Matthew VERDIRAME ,  Thomas VENTURINO

IPC: G03F7/20

CPC classification number: G03F7/70875 ,  G03F7/70341 ,  G03F7/70716 ,  G03F7/70808 ,  G03F7/70858 ,  G03F7/70866

Abstract: A system for controlling temperature of a patterning device in a lithographic apparatus is discussed. The system includes a patterning device support configured to support a patterning device and a reticle cooling system configured to provide substantially uniform temperature distribution across the patterning device. The reticle cooling system includes a first and second array of gas inlets configured to provide a first and second gas flow along a first and second direction across a surface of the patterning device, respectively, where first and second directions are opposite to each other. The reticle cooling system further includes a switching control system configured to control operation of the first and second arrays of gas inlets.

Abstract translation: 讨论了用于控制光刻设备中的图案形成装置的温度的系统。 该系统包括构造成支撑图案形成装置的图案形成装置支撑件和被配置为在图案形成装置上提供基本均匀的温度分布的掩模版冷却系统。 标线冷却系统包括第一和第二气体入口阵列，其被配置为分别在第一和第二方向彼此相对的情况下分别跨越图案形成装置的表面沿着第一和第二方向提供第一和第二气流。 标线冷却系统还包括配置成控制气体入口的第一和第二阵列的操作的开关控制系统。

公开(公告)号：US20150301456A1

公开(公告)日：2015-10-22

申请号：US14439359

申请日：2013-10-21

Applicant: ASML HOLDING N.V. ,  ASML NETHERLANDS B.V.

Inventor： Earl William EBERT, JR. ,  Johannes ONVLEE ,  Samir A. NAYFEH ,  Mark Josef SCHUSTER ,  Peter A. DELMASTRO ,  Christopher Charles WARD ,  Frank Johannes Jacobus VAN BOXTEL ,  Abdullah ALIKHAN ,  Daniel Nathan BURBANK ,  Daniel Nicholas GALBURT ,  Justin Matthew VERDIRAME

IPC: G03F7/20

CPC classification number: G03F7/70875 ,  G03F7/70341 ,  G03F7/70716 ,  G03F7/70808 ,  G03F7/70858 ,  G03F7/70866

Abstract: A patterning device support (1100) for controlling a temperature of a patterning device (1102) can include a movable component (1104). The movable component can include a gas inlet (1108) for supplying a gas flow across a surface of the patterning device and a gas outlet (1110) for extracting the gas flow. The patterning device support can also include a gas flow generator (1118) coupled to a duct (1114, 1116) for recirculating the gas flow from the gas outlet to the gas inlet.

Abstract translation: 用于控制图案形成装置（1102）的温度的图案形成装置支撑件（1100）可以包括可移动部件（1104）。 可移动部件可以包括用于提供穿过图案形成装置的表面的气流的气体入口（1108）和用于提取气体流的气体出口（1110）。 图案形成装置支撑件还可以包括联接到管道（1114,1116）的气流发生器（1118），用于使气流从气体出口再循环到气体入口。

公开(公告)号：US20140016110A1

公开(公告)日：2014-01-16

申请号：US13938746

申请日：2013-07-10

Applicant: ASML Holding N.V.

Inventor： Samir A. NAYFEH ,  Mark Edd WILLIAMS ,  Justin Matthew VERDIRAME

IPC: G03F7/20 ,  H01L21/687

CPC classification number: G03F7/70716 ,  G03F7/707 ,  G03F7/70783 ,  H01L21/683 ,  H01L21/68714 ,  H01L21/6875 ,  Y10S414/141 ,  Y10T279/34

Abstract: A lithographic apparatus is described that comprises a support structure to hold an object. The object may be a patterning device or a substrate to be exposed. The support structure comprises a chuck, on which the object is supported, and an array of shear-compliant elongated elements normal to the chuck and the stage, such that first ends of the elongated elements contact a surface of the chuck and second ends of the elongated elements contact a stage. Through using the array of elongated elements, a transfer of stress between the stage and the chuck is substantially uniform, resulting in minimization of slippage of the object relative to the surface of the chuck during a deformation of the chuck due to the stress.

Abstract translation: 描述了一种光刻设备，其包括用于保持物体的支撑结构。 该物体可以是图案形成装置或要暴露的基板。 支撑结构包括卡盘，物体被支撑在该卡盘上，以及与卡盘和台架垂直的剪切顺应的细长元件的阵列，使得细长元件的第一端接触卡盘的表面和卡盘的第二端 细长元件接触舞台。 通过使用细长元件阵列，载物台与卡盘之间的应力传递基本上是均匀的，从而在由于应力引起的卡盘变形期间，物体相对于卡盘表面的滑动最小化。