Invention Application
- Patent Title: SUBSTRATE TABLE, A LITHOGRAPHIC APPARATUS AND A DEVICE MANUFACTURING METHOD
- Patent Title (中): 基板，平面设备和设备制造方法
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Application No.: US15273416Application Date: 2016-09-22
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Publication No.: US20170075232A1Publication Date: 2017-03-16
- Inventor: Nicolaas TEN KATE , Raymond Wilhelmus Louis LAFARRE
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Main IPC: G03F7/20
- IPC: G03F7/20
Abstract:
A table for a lithographic apparatus, the table having a catchment opening formed in an upper surface of the table, the catchment opening in fluid communication through the table with the environment of the table at a drain opening in a surface of the table other than the upper surface.
Public/Granted literature
- US09857696B2 Substrate table, a lithographic apparatus and a device manufacturing method Public/Granted day:2018-01-02
Information query
IPC分类:
