公开(公告)号：US20230048272A1

公开(公告)日：2023-02-16

申请号：US17952067

申请日：2022-09-23

申请人： ASML NETHERLANDS B.V.

发明人： Raymond Wilhelmus Louis LAFARRE ,  Nicolaas TEN KATE ,  Nina Vladimirovna DZIOMKINA ,  Yogesh Pramod KARADE

IPC分类号： G03F7/20 ,  H01L21/687 ,  C23C16/44

摘要： A substrate holder for a lithographic apparatus has a planarization layer provided on a surface thereof. The planarization layer provides a smooth surface for the formation of an electronic component such as a thin film electronic component. The planarization layer may be provided in multiple sub layers. The planarization layer may smooth over roughness caused by removal of material from a blank to form burls on the substrate holder.

公开(公告)号：US20180173116A1

公开(公告)日：2018-06-21

申请号：US15568122

申请日：2016-04-04

申请人： ASML Netherlands B.V.

发明人： Adrianus Hendrik KOEVOETS ,  Erik Johan ARLEMARK ,  Sander Catharina Reinier DERKS ,  Sjoerd Nicolaas Lambertus DONDERS ,  Wilfred Edward ENDENDIJK ,  Franciscus Johannes Joseph JANSSEN ,  Raymond Wilhelmus Louis LAFARRE ,  Leon Martin LEVASIER ,  Jim Vincent OVERKAMP ,  Nicolaas TEN KATE ,  Jacobus Cornelis Gerardus VAN DER SANDEN

IPC分类号： G03F7/20 ,  H01L21/67

CPC分类号： G03F7/70875 ,  G03F7/2041 ,  G03F7/70258 ,  G03F7/70783 ,  H01L21/67098 ,  H01L21/683

摘要： A lithographic apparatus comprising a projection system configured to project a patterned radiation beam to form an exposure area on a substrate held on a substrate table, the lithographic apparatus further comprising a cooling apparatus (40) for cooling the substrate, wherein the cooling apparatus comprises a cooling element (42, 44) located above the substrate table and adjacent to the exposure area, the cooling element being configured to remove heat from the substrate.

公开(公告)号：US20170315454A1

公开(公告)日：2017-11-02

申请号：US15629399

申请日：2017-06-21

申请人： ASML Netherlands B.V.

发明人： Thibault Simon Mathieu LAURENT ,  Johannes Henricus Wilhelmus JACOBS ,  Wilhelmus Franciscus Johannes SIMONS ,  Martijn HOUBEN ,  Raymond Wilhelmus Louis LAFARRE ,  Koen STEFFENS ,  Han Henricus Aldegonda LEMPENS ,  Rogier Hendrikus Magdalena CORTIE ,  Ruud Hendrikus Martinus Johannes BLOKS ,  Gerben PIETERSE ,  Siegfried Alexander TROMP ,  Theodorus Wilhelmus POLET ,  Jim Vincent OVERKAMP ,  Van Vuong VY

IPC分类号： G03F7/20 ,  H01L21/68

CPC分类号： G03F7/70341 ,  G03F7/70716 ,  G03F7/70875 ,  G03F7/7095 ,  H01L21/682

摘要： An object table to support an object, the object table having a support body, an object holder to hold an object, an opening adjacent an edge of the object holder, and a channel in fluid communication with the opening via a passageway, wherein the channel is defined by a first material which is different to a second material defining the passageway.

公开(公告)号：US20170235235A1

公开(公告)日：2017-08-17

申请号：US15587086

申请日：2017-05-04

申请人： ASML NETHERLANDS B.V.

发明人： Raymond Wilhelmus Louis LAFARRE ,  Nicolaas TEN KATE ,  Nina Vladimirovna DZIOMKINA ,  Yogesh Pramod KARADE

IPC分类号： G03F7/20

CPC分类号： G03F7/70716 ,  C23C16/44 ,  G03F7/70341 ,  G03F7/707 ,  G03F7/70975 ,  H01L21/6875 ,  Y10T29/49

摘要： A substrate holder for a lithographic apparatus has a planarization layer provided on a surface thereof. The planarization layer provides a smooth surface for the formation of an electronic component such as a thin film electronic component. The planarization layer may be provided in multiple sub layers. The planarization layer may smooth over roughness caused by removal of material from a blank to form burls on the substrate holder.

公开(公告)号：US20160231655A1

公开(公告)日：2016-08-11

申请号：US15131986

申请日：2016-04-18

申请人： ASML NETHERLANDS B.V.

发明人： Raymond Wilhelmus Louis LAFARRE ,  Nina Vladimirovna DZIOMKINA ,  Yogesh Pramod KARADE ,  Elisabeth Corinne RODENBURG ,  Peter VAN DELFT

IPC分类号： G03F7/20 ,  B05D1/00

CPC分类号： G03F7/70716 ,  B05D1/005 ,  G03F7/70341 ,  G03F7/70691 ,  G03F7/707

摘要： A substrate holder for a lithographic apparatus has a planarization layer provided on a surface thereof. The planarization layer provides a smooth surface for the formation of a thin film stack forming an electronic component. The planarization layer is of substantially uniform thickness and/or its outer surface has a peak to valley distance of less than 10 μm. The planarization layer may be formed by applying two solutions of different concentration. A surface treatment may be applied to the burls to repel a solution of the planarization layer material.

摘要翻译： 用于光刻设备的衬底保持器具有设置在其表面上的平坦化层。 平坦化层为形成电子部件的薄膜叠层的形成提供光滑的表面。 平坦化层具有基本均匀的厚度和/或其外表面具有小于10μm的峰谷距离。 可以通过施加不同浓度的两种溶液来形成平坦化层。 表面处理可以施加到毛圈以排斥平坦化层材料的溶液。

公开(公告)号：US20160170310A1

公开(公告)日：2016-06-16

申请号：US15048826

申请日：2016-02-19

申请人： ASML NETHERLANDS B.V.

发明人： Nicolaas TEN KATE ,  Raymond Wilhelmus Louis LAFARRE

IPC分类号： G03F7/20

CPC分类号： G03F7/70716 ,  G03F7/70341

摘要： A table for a lithographic apparatus, the table having a catchment opening formed in an upper surface of the table, the catchment opening in fluid communication through the table with the environment of the table at a drain opening in a surface of the table other than the upper surface.

公开(公告)号：US20220331862A1

公开(公告)日：2022-10-20

申请号：US17856520

申请日：2022-07-01

申请人： ASML NETHERLANDS B.V.

发明人： Raymond Wilhelmus Louis LAFARRE ,  Sjoerd Nicolaas Lambertus DONDERS ,  Nicolaas TEN KATE ,  Nina Vladimirovna DZIOMKINA ,  Yogesh Pramod KARADE ,  Elisabeth Corinne RODENBURG

IPC分类号： B22F7/06 ,  B23K26/354 ,  B23K26/342 ,  G03F7/20 ,  B22F10/20 ,  B22F10/00 ,  B23Q3/18 ,  B05D3/06 ,  B05D5/00 ,  B33Y10/00 ,  B33Y80/00

摘要： An object holder for a lithographic apparatus has a main body having a surface. A plurality of burls to support an object is formed on the surface or in apertures of a thin-film stack. At least one of the burls is formed by laser-sintering. At least one of the burs formed by laser-sintering may be a repair of a damaged burl previously formed by laser-sintering or another method.

公开(公告)号：US20190243256A1

公开(公告)日：2019-08-08

申请号：US16271303

申请日：2019-02-08

申请人： ASML NETHERLANDS B.V.

发明人： Takeshi KANEKO ,  Joost Jeroen OTTENS ,  Raymond Wilhelmus Louis LAFARRE

IPC分类号： G03F7/20

CPC分类号： G03F7/70716 ,  G03F7/70341 ,  G03F7/70775

摘要： A table for a lithographic apparatus, the table having an encoder plate located on the table, a gap between the encoder plate and a top surface of the table, the gap located radially inward of the encoder plate relative to the periphery of the table, and a fluid extraction system with an opening in the surface of the gap to extract liquid from the gap.

公开(公告)号：US20190227445A1

公开(公告)日：2019-07-25

申请号：US16326948

申请日：2017-08-11

申请人： ASML Netherlands B.V.

发明人： Frits VAN DER MEULEN ,  Erik Johan ARLEMARK ,  Hendrikus Herman Marie COX ,  Martinus Agnes Willem CUIJPERS ,  Joost DE HOOGH ,  Gosse Charles DE VRIES ,  Paul Comé Henri DE WIT ,  Sander Catharina Reinier DERKS ,  Ronald Comelis Gerardus GIJZEN ,  Dries Vaast Paul HEMSCHOOTE ,  Christiaan Alexander HOOGENDAM ,  Adrianus Hendrik KOEVOETS ,  Raymond Wilhelmus Louis LAFARRE ,  Alain Louis Claude LEROUX ,  Patrick Willem Paul LIMPENS ,  Jim Vincent OVERKAMP ,  Christiaan Louis VALENTIN ,  Koos VAN BERKEL ,  Stan Henricus VAN DER MEULEN ,  Jacobus Comelis Gerardus VAN DER SANDEN ,  Harmen Klaas VAN DER SCHOOT ,  David Ferdinand VLES ,  Evert Auke Rinze WESTERHUIS

IPC分类号： G03F7/20

摘要： A lithographic apparatus comprising a projection system configured to project a patterned radiation beam to form an exposure area on a substrate held on a substrate table, the lithographic apparatus further comprising a cooling apparatus for cooling the substrate, wherein the cooling apparatus comprises a cooling element located above the substrate table and adjacent to the exposure area, the cooling element being configured to remove heat from the substrate.

公开(公告)号：US20180286738A1

公开(公告)日：2018-10-04

申请号：US15767514

申请日：2016-09-28

申请人： ASML Netherlands B.V.

发明人： Mahdiar VALEFI ,  Raymond Wilhelmus Louis LAFARRE

IPC分类号： H01L21/683 ,  G03F7/20 ,  H01L21/687

CPC分类号： H01L21/6838 ,  G03F7/707 ,  G03F7/70708 ,  G03F7/70716 ,  G03F7/70775 ,  H01L21/6831 ,  H01L21/6875 ,  H01L21/68757

摘要： A lithographic apparatus substrate table comprises a plurality of first projections, whereby the first projections define a first substrate supporting plane and a plurality of second projections, whereby the second projections define a second substrate supporting plane. The substrate table further comprises a clamping device configured to exert a clamping force onto the substrate. The second substrate supporting plane is parallel to the first substrate supporting plane. The second substrate supporting plane is offset in respect of the first substrate supporting plane in a direction perpendicular to the first and second substrate supporting planes. The lithographic apparatus substrate table is configured to support the substrate on the second projections at the second substrate supporting plane before application of the clamping force by the clamping device. The second projections are configured to deform upon application by the clamping device of the clamping force onto the substrate, thereby providing the substrate to move from the second substrate supporting plane to the first substrate supporting plane when clamped by the clamping device.