Invention Application
- Patent Title: THERMAL BASE GENERATOR, THERMOSETTING RESIN COMPOSITION, CURED FILM, CURED FILM MANUFACTURING METHOD, AND SEMICONDUCTOR DEVICE
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Application No.: US15389729Application Date: 2016-12-23
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Publication No.: US20170101521A1Publication Date: 2017-04-13
- Inventor: Ichiro KOYAMA
- Applicant: FUJIFILM Corporation
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Priority: JP2014-132156 20140627; JP2014-203868 20141002; JP2015-034388 20150224
- Main IPC: C08K5/19
- IPC: C08K5/19 ; H01L21/768 ; B05D3/00 ; C09D179/08 ; C08K5/18 ; C08K5/3462 ; H01L23/532

Abstract:
Provided are a thermal base generator which is capable of performing cyclization of a. thermosetting resin at a low temperature and with which a thermosetting resin composition having excellent stability can be prepared, a thermosetting resin composition, a cured film, a cured film manufacturing method, and a semiconductor device.The thermal base generator includes at least one selected from an acidic compound which generates a base in a case of being heated to 40° C. or higher, and an ammonium salt containing an anion having a pKa1 of 0 to 4 and an ammonium cation. The acidic compound is preferably an ammonium salt and/or a compound represented by the following General Formula (1), in which A1 represents a p-valent organic group, R1 represents a monovalent organic group, L1 represents an (m+1)-valent organic group, m represents an integer of 1 or more, and p represents an integer of 1 or more.
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