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公开(公告)号:US11535689B2
公开(公告)日:2022-12-27
申请号:US15737884
申请日:2016-06-20
发明人: Tsuyoshi Yorino , Daisuke Takeda , Yoshitaka Ikeuchi , Shigeru Sakamoto , Yoshihiro Shobo , Yoshifumi Adachi , Ryota Wakabayashi , Daisuke Takagi , Sachie Kitabata
IPC分类号: C08F220/06 , C08J3/12 , C08J3/24 , C08K5/06 , C08K5/19 , C08K5/42 , C08K5/32 , C08K5/17 , C08K5/1535 , A61L15/24 , A61L15/60 , C08F220/00 , C08F6/00 , A61L15/00
摘要: To provide a disposable diaper enabling reduction in re-wet amount and having an excellent speed of incorporating liquid regardless of concentration and configuration of a water-absorbing agent in an absorbent material.
A water-absorbing agent having excellent Gel Capillary Absorption (GCA) and Free Gel Bed Permeability (FGBP) is obtained by crushing a crosslinked hydrogel polymer obtained in a polymerization step to have a specific weight average particle diameter while fluid retention capacity and a surface tension of a water-absorbing agent are adjusted in a specific range, drying the crushed crosslinked hydrogel polymer, and then adding a liquid permeability enhancer thereto during surface crosslinking or after surface crosslinking.-
公开(公告)号:US11447637B2
公开(公告)日:2022-09-20
申请号:US16806416
申请日:2020-03-02
申请人: Ecolab USA Inc.
发明人: Robert Gabel , Glenda Vale , Eric Bauch , Chenthamarkshan Nair , Adam Meyers
IPC分类号: C08K5/09 , C08K5/092 , C08L95/00 , C08K3/22 , C08K3/24 , C08K5/05 , C08K5/103 , C08K5/13 , C08K5/17 , C08K5/19 , C08K5/3445 , E01C7/35 , E01C11/00
摘要: Compositions and methods are provided for treating a pavement such as by microsurfacing or slurry sealing. The compositions contain iron chelants that are effective in reducing discoloration of the pavement surface.
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公开(公告)号:US11359048B2
公开(公告)日:2022-06-14
申请号:US16408725
申请日:2019-05-10
IPC分类号: C08G59/50 , C08G59/56 , C08G59/68 , C08G59/24 , C08L63/02 , C09D163/02 , C09J163/02 , C08G59/28 , C09D163/00 , C09J163/00 , C08K5/19 , C08K5/50
摘要: The present invention provides a composition comprising
a) at least one epoxy resin,
b) at least one cyclic amine of the formula (I) in which R1 to R4 is H or an organic radical, with the proviso that at least one of the R1, R2, R3 and R4 radicals ═H, and X═—(Y1)m-(A1)n-(Y2)o-(A2)p-(Y3)q-(A3)r-(Y4)s— (II) where, independently of one another, m, n, o, p, q, r and s=0 or 1, A1, A2, A3=alkylene or alkenylene radical and Y1, Y2, Y3, Y4═NR5, PR5, O or S, where R5 independently=organic radical, where any two organic radicals selected from R1 to R5 and any radicals present in the alkylene and/or alkenylene radicals A1, A2, A3 may also form one or more further rings, with the proviso that at least one of the radicals selected from R1 to R5 present and any radicals present in the alkylene and/or alkenylene radicals A1, A2, A3 is substituted by at least one —NHR6 or —NH2 group, where R6=organic radical, and c) at least one salt of a strong Brønsted acid with a counterion selected from metal ions, metal-containing ions, phosphonium ions and unsubstituted ammonium ions, where the ratio of the epoxy groups in the epoxy resin to the sum total of all NH groups in all amines is 0.5:1 to 1.5:1, and to processes for production thereof and use thereof.-
公开(公告)号:US20220017723A1
公开(公告)日:2022-01-20
申请号:US17157208
申请日:2021-01-25
摘要: Resin particles include resin base particles and silica particles on surfaces of the resin base particles. The silica particles contain a quaternary ammonium salt and have hydrophobized surfaces. A difference (detection temperature A−detection temperature B) between a detection temperature A and a detection temperature B is more than 50° C., where the detection temperature A is a detection temperature from a pyrolysis product of the quaternary ammonium salt determined by pyrolysis mass spectrometry of the resin particles before cleaning, and the detection temperature B is a detection temperature from the pyrolysis product of the quaternary ammonium salt determined by pyrolysis mass spectrometry of the resin particles after cleaning.
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公开(公告)号:US11220603B2
公开(公告)日:2022-01-11
申请号:US16300025
申请日:2017-04-18
摘要: The invention relates to a silicate coating containing (A) at least one compound of the formula (I), where R1 represents H, C1-C4-alkyl, CH2CH2OH, or CH2CH(CH3)OH, (B) at least one silicate binder, (C) if appropriate, one or more polymer binders, (D) if appropriate, further additives usual for the production of silica coatings, and (E) water.
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公开(公告)号:US11203661B2
公开(公告)日:2021-12-21
申请号:US16312016
申请日:2017-07-10
IPC分类号: C08G59/12 , C08G63/90 , C08G63/91 , C08K3/20 , C08K3/24 , C08K5/19 , C08K5/49 , C09D5/03 , C09D167/00
摘要: The present invention relates to a process for the manufacture of an epoxy-functional polyester, and to solid epoxy-functional polyesters made by such process and to a coating composition, in particular a powder coating composition, comprising such solid epoxy-functional polyester. The polyester made as disclosed herein is particularly useful in powder coatings.
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公开(公告)号:US20210363374A1
公开(公告)日:2021-11-25
申请号:US17313064
申请日:2021-05-06
IPC分类号: C09D11/54 , C09D11/037 , C09D11/106 , C08K5/21 , C08K5/19 , C08K5/17 , C08K5/053 , C08K5/098 , B41M5/00 , B41J2/21
摘要: The present invention relates to an aqueous reaction liquid composition comprising an anti-deforming agent. selected from the group consisting of a choline salt (formate, acetate, chloride), a guanidine salt (formate, acetate, chloride), trimethylglycine (betaine), potassium formate and ammonium nitrate. The present invention also relates to an aqueous reaction liquid composition comprising a Deep Eutectic Solvent (DES) comprising urea in combination with an anti-deforming agent as disclosed above. In another aspect the invention relates to an ink set comprising such aqueous reaction liquid composition and an ink composition, preferably a pigmented ink composition. In another aspect the present invention relates to a printing method including application of an aqueous reaction liquid composition according to the present invention and application of an ink composition.
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公开(公告)号:US11180632B2
公开(公告)日:2021-11-23
申请号:US16163139
申请日:2018-10-17
IPC分类号: C08K5/3415 , C08K5/07 , C08K3/36 , C08K5/098 , C08K3/08 , C08K5/14 , C08K5/19 , F16L55/165
摘要: A process to use an unsaturated polyester resin system comprising preparing a curable cumene-quat curing system. The cumene-quat curing system can comprise an unsaturated polyester resin, a peroxide initiator, a quaternary ammonium salt component, a 2,4-pentanedione component, and an inhibitor component. The peroxide initiator can comprise a cumene hydroperoxide component. The process can further comprise applying the curable cumene-quat curing system in a cured-in-place pipe rehabilitation process.
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公开(公告)号:US20210283074A1
公开(公告)日:2021-09-16
申请号:US17121874
申请日:2020-12-15
申请人: Nasus Pharma Ltd.
IPC分类号: A61K31/14 , C08K5/092 , C08K5/098 , C08K5/19 , A61K9/00 , A61K47/12 , A61K47/22 , A61K31/192 , A61K31/055 , A61K31/4166 , A61K31/4178 , A61K31/197 , A61K33/00 , A61K31/19 , A61K31/225 , A61P31/12 , A61K9/06 , A61P31/16 , A61K9/16 , A61M15/08 , A61M15/00
摘要: A composition in the form of dry powder for intranasal administration, having solid particles, each having a physiologically acceptable mucoadhesive polymer in combination with at least one functional additive such as pH adjusting agent, with at least about 90% of the particles having a size of about 25-300 microns, and various prophylactic and preventive uses thereof.
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公开(公告)号:US20210198510A1
公开(公告)日:2021-07-01
申请号:US17132309
申请日:2020-12-23
摘要: An ink jet ink contains: an inorganic oxide colloid; an amino acid; a first glycol monoether represented by the following formula (1): R11O—(R12O)n1—H (1); a second glycol monoether represented by the following formula (2): R21O—(R22O)n2—H(2); and water. In the ink jet ink described above, in the formula (1), R11 represents an alkyl group having 2 to 10 carbon atoms, R12 represents an alkylene group having 2 to 4 carbon atoms, and n1 represents a repetition number of 1 to 10, and in the formula (2), R21 represents an alkyl group having 1 to 8 carbon atoms, R22 represents an alkylene group having 2 to 4 carbon atoms, the number of carbon atoms of R21 is smaller than the number of carbon atoms of R11, and n2 represents a repetition number of 1 to 10.
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