Invention Application
- Patent Title: SPUTTERING APPARATUS
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Application No.: US15238377Application Date: 2016-08-16
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Publication No.: US20170110299A1Publication Date: 2017-04-20
- Inventor: Chang Oh JEONG , Hyun Eok SHIN , Hyun Ju KANG , Joon Yong PARK , Sang Woo SOHN , Sang Won SHIN , Dong Hee LEE
- Applicant: Samsung Display Co., Ltd.
- Priority: KR10-2015-0143554 20151014
- Main IPC: H01J37/34
- IPC: H01J37/34 ; C23C14/34

Abstract:
A sputtering apparatus includes a chamber, a target section disposed in the chamber, and a stage facing the target section. The target section includes a first target having a first diameter and a second target having a second diameter different from the first diameter. The first target and the second target each extend in a longitudinal direction and have a cylindrical shape, and the first and second diameters are respectively measured along a cross-section of corresponding first and second targets taken along a direction perpendicular to the longitudinal direction.
Information query