Invention Application
- Patent Title: PHYSICAL VAPOR DEPOSITION SYSTEM USING ROTATING PALLET WITH X AND Y POSITIONING
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Application No.: US14923348Application Date: 2015-10-26
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Publication No.: US20170114449A1Publication Date: 2017-04-27
- Inventor: Ravi Mullapudi , Srikanth Dasaradhi , Lee LaBlanc , Suresh Palanisamy , Venkata Dora Chowdary Kakarla
- Applicant: Tango Systems, Inc.
- Main IPC: C23C14/50
- IPC: C23C14/50 ; H01J37/32 ; H01J37/34 ; C23C14/35 ; C23C14/54

Abstract:
A circular PVD chamber has a plurality of sputtering targets mounted on a top wall of the chamber. A pallet in the chamber is coupled to a motor for rotating the pallet about its center axis. The pallet has a diameter less than the diameter of the circular chamber. The pallet is also shiftable in an XY direction to move the center of the pallet beneath any of the targets so all areas of a workpiece supported by the pallet can be positioned directly below any one of the targets. A scanning magnet is in back of each target and is moved, via a programmed controller, to only be above portions of the workpiece so that no sputtered material is wasted. For depositing a material onto small workpieces, a cooling backside gas volume is created between the pallet and the underside of sticky tape supporting the workpieces.
Public/Granted literature
- US09957606B2 Physical vapor deposition system using rotating pallet with X and Y positioning Public/Granted day:2018-05-01
Information query
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