Invention Application
- Patent Title: APPARATUS AND METHODS TO CREATE MICROELECTRONIC DEVICE ISOLATION BY CATALYTIC OXIDE FORMATION
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Application No.: US15323726Application Date: 2014-08-05
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Publication No.: US20170162693A1Publication Date: 2017-06-08
- Inventor: Gopinath Bhimarasetti , Walid Hafez , Joodong Park , Weimin Han , Raymond Cotner
- Applicant: INTEL CORPORATION
- Applicant Address: US CA Santa Clara
- Assignee: INTEL CORPORATION
- Current Assignee: INTEL CORPORATION
- Current Assignee Address: US CA Santa Clara
- International Application: PCT/US2014/049674 WO 20140805
- Main IPC: H01L29/78
- IPC: H01L29/78 ; H01L21/762 ; H01L29/66 ; H01L29/423

Abstract:
Non-planar transistor devices which include oxide isolation structures formed in semiconductor bodies thereof through the formation of an oxidizing catalyst layer on the semiconductor bodies followed by an oxidation process. In one embodiment, the semiconductor bodies may be formed from silicon-containing materials and the oxidizing catalyst layer may comprise aluminum oxide, wherein oxidizing the semiconductor body to form an oxide isolation zone forms a semiconductor body first portion and a semiconductor body second portion with the isolation zone substantially electrically separating the semiconductor body first portion and the semiconductor body second portion.
Public/Granted literature
- US1630468A Band saw and wheel therefor Public/Granted day:1927-05-31
Information query
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