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    Transistor with dual-gate spacer
    2.
    发明授权
    Transistor with dual-gate spacer 有权

    公开(公告)号：US10535747B2

    公开(公告)日：2020-01-14

    申请号：US15778306

    申请日：2015-12-23

    申请人： INTEL CORPORATION

    发明人： En-Shao Liu ,  Joodong Park ,  Chen-Guan Lee ,  Chia-Hong Jan

    IPC分类号： H01L29/49 ,  H01L21/28 ,  H01L21/764 ,  H01L29/78 ,  H01L29/66

    摘要： Techniques are disclosed for forming a transistor with one or more additional gate spacers. The additional spacers may be formed between the gate and original gate spacers to reduce the parasitic coupling between the gate and the source/drain, for example. In some cases, the additional spacers may include air gaps and/or dielectric material (e.g., low-k dielectric material). In some cases, the gate may include a lower portion and an upper portion. In some such cases, the lower portion of the gate may be narrower in width between the original gate spacers than the upper portion of the gate, which may be as a result of the additional spacers being located between the lower portion of the gate and the original gate spacers. In some such cases, the gate may approximate a “T” shape or various derivatives of that shape such as -shape or -shape, for example.

    Dual height glass for finFET doping
    3.
    发明授权
    Dual height glass for finFET doping 有权

    公开(公告)号：US10304681B2

    公开(公告)日：2019-05-28

    申请号：US15573458

    申请日：2015-06-22

    申请人： Intel Corporation

    发明人： Chen-Guan Lee ,  Lu Yang ,  Joodong Park ,  Chia-Hong Jan

    IPC分类号： H01L29/78 ,  H01L21/225 ,  H01L29/66 ,  H01L27/088 ,  H01L29/06

    摘要： Dual height glass is described for doping a fin of a field effect transistor structure in an integrated circuit. In one example, a method includes applying a glass layer over a fin of a FinFET structure, the fin having a source/drain region and a gate region, applying a polysilicon layer over the gate region, removing a portion of the glass layer from the source/drain region after applying the polysilicon, and thermally annealing the glass to drive dopants into the fin, and applying an epitaxial layer over the source/drain region.

    Ultra-scaled fin pitch having dual gate dielectrics
    9.
    发明授权
    Ultra-scaled fin pitch having dual gate dielectrics 有权

    公开(公告)号：US10784378B2

    公开(公告)日：2020-09-22

    申请号：US16318108

    申请日：2016-09-30

    申请人： Intel Corporation

    发明人： Walid M. Hafez ,  Roman W. Olac-Vaw ,  Joodong Park ,  Chen-Guan Lee ,  Chia-Hong Jan ,  Everett S. Cassidy-Comfort

    IPC分类号： H01L27/088 ,  H01L29/78 ,  H01L21/84 ,  H01L27/12 ,  H01L29/417 ,  H01L29/66

    摘要： Ultra-scaled fin pitch processes having dual gate dielectrics are described. For example, a semiconductor structure includes first and second semiconductor fins above a substrate. A first gate structure includes a first gate electrode over a top surface and laterally adjacent to sidewalls of the first semiconductor fin, a first gate dielectric layer between the first gate electrode and the first semiconductor fin and along sidewalls of the first gate structure, and a second gate dielectric layer between the first gate electrode and the first gate dielectric layer and along the first gate dielectric layer along the sidewalls of the first gate electrode. A second gate structure includes a second gate electrode over a top surface and laterally adjacent to sidewalls of the second semiconductor fin, and the second gate dielectric layer between the second gate electrode and the second semiconductor fin and along sidewalls of the second gate electrode.