发明申请
- 专利标题: SENSOR ARRANGEMENT FOR PARTICLE ANALYSIS AND A METHOD FOR PARTICLE ANALYSIS
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申请号: US15043701申请日: 2016-02-15
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公开(公告)号: US20170234822A1公开(公告)日: 2017-08-17
- 发明人: Guenther RUHL , Thomas HIRSCH , Gerhard POEPPEL , Herbert ROEDIG
- 申请人: Infineon Technologies AG
- 主分类号: G01N27/22
- IPC分类号: G01N27/22 ; G01N15/10
摘要:
According to various embodiments, a sensor arrangement for particle analysis may include: a base electrode configured to generate an electrical field for particle attraction; a support layer disposed over the base electrode; a sensor array disposed over the support layer and including or formed from a plurality of sensor elements, wherein each sensor element of the plurality of sensor elements is configured to generate or modify an electrical signal in response to a particle at least one of adsorbed to and approaching the sensor element; and an electrical contact structure may include or be formed from a plurality of contact lines, wherein each contact line of the plurality of contact lines is electrically connected to a respective sensor element of the plurality of sensor elements, such that each sensor element of the plurality of sensor elements is addressable via the contact structure.
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