Invention Application
- Patent Title: SHADOW MASK, FILM FORMING SYSTEM USING SHADOW MASK AND METHOD OF MANUFACTURING A DISPLAY DEVICE
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Application No.: US15425224Application Date: 2017-02-06
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Publication No.: US20170247788A1Publication Date: 2017-08-31
- Inventor: Taiki WATANABE
- Applicant: Japan Display Inc.
- Applicant Address: JP Minato-ku
- Assignee: Japan Display Inc.
- Current Assignee: Japan Display Inc.
- Current Assignee Address: JP Minato-ku
- Priority: JP2016-037906 20160229
- Main IPC: C23C14/04
- IPC: C23C14/04 ; H01L51/00 ; C23C14/34 ; H01L51/56
Abstract:
A shadow mask includes a mask foil and a plurality of openings provided on the mask foil in accordance with a shape of at least one region where films are formed on a film forming object. The mask foil has an annular shape where first end of the mask foil and a second end of the mask foil, which is opposed to the first end of the mask foil, are connected to each other.
Public/Granted literature
- US09976210B2 Shadow mask, film forming system using shadow mask and method of manufacturing a display device Public/Granted day:2018-05-22
Information query
IPC分类:
