The exhaust gas purification device is provided with a wall flow structure substrate that has an entry-side cell, an exit-side cell and a porous partition, first catalyst parts which are formed in small pores having a relatively small pore diameter among internal pores in the partition, and second catalyst parts which are formed in large pores having a relatively large pore diameter among the internal pores in the partition. The first catalyst parts and the second catalyst parts each contain a carrier and at least one type of noble metal from among Pt, Pd and Rh supported on the carrier. The noble metal content in the first catalyst parts is smaller than the noble metal content in the second catalyst parts per 1 liter of substrate volume.