Invention Application
- Patent Title: METHOD, APPARATUS, AND SYSTEM FOR IMPROVED CELL DESIGN HAVING UNIDIRECTIONAL METAL LAYOUT ARCHITECTURE
-
Application No.: US15149066Application Date: 2016-05-06
-
Publication No.: US20170323902A1Publication Date: 2017-11-09
- Inventor: Jia Zeng , Lei Yuan , Jongwook Kye , Harry J. Levinson
- Applicant: GLOBALFOUNDRIES INC.
- Applicant Address: KY Grand Cayman
- Assignee: GLOBALFOUNDRIES INC.
- Current Assignee: GLOBALFOUNDRIES INC.
- Current Assignee Address: KY Grand Cayman
- Main IPC: H01L27/118
- IPC: H01L27/118 ; H01L27/092 ; H01L23/528 ; H01L21/3205 ; H01L23/522 ; H01L21/768 ; H01L27/105 ; H01L27/02
Abstract:
At least one method, apparatus and system disclosed involves circuit layout for comprising a unidirectional metal layout. A first trench silicide (TS) formation is formed in a first active area of a functional cell. A first CA formation if formed above the first TS formation. A first vertical metal formation is formed in a first metal layer from the first active area to a second active area of the functional cell. The first vertical metal formation is formed offset relative to, and in contact with, the CA formation. A second TS formation is formed in a second active area of the functional cell. A second CA formation is formed above the second TS formation. The CA formation is formed offset the first vertical metal formation, operatively coupling the first and second active areas.
Information query
IPC分类:
