Invention Application
- Patent Title: LITHOGRAPHIC METHOD AND APPARATUS
-
Application No.: US15527254Application Date: 2015-11-30
-
Publication No.: US20170357159A1Publication Date: 2017-12-14
- Inventor: Nick KANT , Nico VANROOSE , Johannes Jacobus Matheus BASELMANS
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Priority: EP14195783.7 20141202; EP15186673.8 20150924; EP15196964.9 20151130
- International Application: PCT/EP2015/078096 WO 20151130
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G01M11/02
Abstract:
A method of reducing an aberration of a lithographic apparatus, the method including measuring the aberration, taking the measured aberration into account, estimating a state of the lithographic apparatus, calculating a correction using the estimated state, and applying the correction to the lithographic apparatus.
Public/Granted literature
- US10451977B2 Lithographic method and apparatus Public/Granted day:2019-10-22
Information query
IPC分类:
