公开(公告)号：US20180259859A1

公开(公告)日：2018-09-13

申请号：US15760629

申请日：2016-08-26

Applicant: ASML NETHERLANDS B.V.

Inventor： Nick KANT ,  Mark Jan Hendrik LUTTIKHOF

IPC: G03F7/20

CPC classification number: G03F7/70875 ,  G03F7/705 ,  G03F7/70516 ,  G03F7/70783

Abstract: A method of reducing effects of reticle heating and/or cooling in a lithographic process, the method including calibrating a linear time invariant reticle heating model using a system identification method; predicting distortions of the reticle using the reticle heating model and inputs in the lithographic process; and calculating and applying a correction in the lithographic process on the basis of the predicted distortions of the reticle.

公开(公告)号：US20190324376A1

公开(公告)日：2019-10-24

申请号：US16458601

申请日：2019-07-01

Applicant: ASML NETHERLANDS B.V.

Inventor： Nick KANT ,  Mark Jan Hendrik LUTTIKHOF

IPC: G03F7/20

Abstract: A method of reducing effects of reticle heating and/or cooling in a lithographic process, the method including calibrating a linear time invariant reticle heating model using a system identification method; predicting distortions of the reticle using the reticle heating model and inputs in the lithographic process; and calculating and applying a correction in the lithographic process on the basis of the predicted distortions of the reticle.

公开(公告)号：US20170357159A1

公开(公告)日：2017-12-14

申请号：US15527254

申请日：2015-11-30

Applicant: ASML NETHERLANDS B.V.

Inventor： Nick KANT ,  Nico VANROOSE ,  Johannes Jacobus Matheus BASELMANS

IPC: G03F7/20 ,  G01M11/02

CPC classification number: G03F7/706 ,  G01M11/0242 ,  G03F7/20 ,  G03F7/70258 ,  G03F7/70308 ,  G03F7/705

Abstract: A method of reducing an aberration of a lithographic apparatus, the method including measuring the aberration, taking the measured aberration into account, estimating a state of the lithographic apparatus, calculating a correction using the estimated state, and applying the correction to the lithographic apparatus.