- 专利标题: SILICON WAFER EDGE PROTECTION DEVICE
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申请号: US15541331申请日: 2015-12-27
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公开(公告)号: US20170357162A1公开(公告)日: 2017-12-14
- 发明人: Xu ZHOU , Haicang CUI , Fei NI , Lili GE
- 申请人: SHANGHAI MICRO ELECTRONICS EQUIPMENT (GROUP) CO., LTD.
- 申请人地址: CN Shanghai
- 专利权人: SHANGHAI MICRO ELECTRONICS EQUIPMENT (GROUP) CO., LTD.
- 当前专利权人: SHANGHAI MICRO ELECTRONICS EQUIPMENT (GROUP) CO., LTD.
- 当前专利权人地址: CN Shanghai
- 优先权: CN201410857409.5 20141230
- 国际申请: PCT/CN2015/099084 WO 20151227
- 主分类号: G03F7/20
- IPC分类号: G03F7/20
摘要:
A silicon wafer edge protection device having: a horizontal motion assembly; vertical motion assembly; speed regulating device, which is in signal connection with the vertical motion assembly and used for regulating vertical motion assembly motion speed; flexible bumper assembly, which is connected to the horizontal motion assembly and vertical motion assembly and used for reducing the amplitude of vibration of the silicon wafer edge protection device when a collision occurs; and control device, which is in signal connection with the speed regulating device and used for sending a control signal to the speed regulating device to control motion of the vertical motion assembly. The silicon wafer edge protection device can prevent a wafer stage from undergoing an instantaneous strong impact and prevent a silicon wafer from being crushed. When a collision occurs, the wafer stage and the silicon wafer can be protected. Production efficiency is also improved.
公开/授权文献
- US09964864B2 Silicon wafer edge protection device 公开/授权日:2018-05-08
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