Invention Application
- Patent Title: PROJECTION EXPOSURE DEVICE
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Application No.: US15542281Application Date: 2016-01-06
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Publication No.: US20180003952A1Publication Date: 2018-01-04
- Inventor: Michinobu Mizumura
- Applicant: V TECHNOLOGY CO., LTD.
- Applicant Address: JP Kanagawa
- Assignee: V TECHNOLOGY CO., LTD.
- Current Assignee: V TECHNOLOGY CO., LTD.
- Current Assignee Address: JP Kanagawa
- Priority: JP2015-003636 20150109
- International Application: PCT/JP2016/050221 WO 20160106
- Main IPC: G02B26/10
- IPC: G02B26/10 ; G02B3/00 ; G03F7/20

Abstract:
A projection exposure device projects exposure light onto a substrate via a microlens array. The projection exposure device includes a scanning exposure unit that moves the microlens array along a scanning direction from one end toward another end of the substrate, and a microlens array shift unit that moves the microlens array in a shift direction intersecting with the scanning direction during movement of the microlens array caused by the scanning exposure unit.
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