Invention Application
- Patent Title: ANTIREFLECTION FILM AND METHOD OF PRODUCING THE SAME
-
Application No.: US15700382Application Date: 2017-09-11
-
Publication No.: US20180011224A1Publication Date: 2018-01-11
- Inventor: Hiroki TAKAHASHI
- Applicant: FUJIFILM Corporation
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Priority: JP2015-072641 20150331
- Main IPC: B32B37/14
- IPC: B32B37/14 ; B32B9/04

Abstract:
An antireflection film substrate that is provided on a surface of a substrate includes a surface layer having an alumina hydrate as a main component. The surface layer has an uneven structure in which a volume proportion of the alumina hydrate per unit volume decreases in a direction from the substrate side to a surface side, and a period of apexes distributed on the uneven structure on the surface side is configured to be equal to or less than a wavelength of light of which reflection is to be suppressed.
Public/Granted literature
- US10520648B2 Antireflection film and method of producing the same Public/Granted day:2019-12-31
Information query