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公开(公告)号：US20170192132A1
公开(公告)日：2017-07-06
申请号：US15468863
申请日：2017-03-24
Applicant: FUJIFILM Corporation
Inventor： Hiroki TAKAHASHI , Takeshi IIDA
CPC classification number: G02B1/111 , C03C3/321 , C03C17/3441 , C03C17/3452 , C03C2217/28 , C03C2217/734 , C03C2218/154 , G02B1/113 , G02B1/115 , G02B1/14 , G02B13/14
Abstract: Provided is an antireflection film having excellent abrasion resistance.In the antireflection film, a hydrogenated carbon film as a first layer is formed on a surface of an optical substrate. A MgF2 film as a second layer having a lower refractive index than the first layer is formed on the first layer. Likewise, a third layer formed of the hydrogenated carbon film, a fourth layer formed of the MgF2 film, and a fifth layer formed of the hydrogenated carbon film are formed. During the formation of the hydrogenated carbon film, a mixed gas of argon and hydrogen is supplied to a vacuum chamber such that some of C—C bonds in the film are replaced with C—H bonds. Due to the C—H bonds, an antireflection film having excellent abrasion resistance and adhesiveness and having a low refractive index can be obtained.
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公开(公告)号：US20230333303A1
公开(公告)日：2023-10-19
申请号：US18338119
申请日：2023-06-20
Applicant: FUJIFILM Corporation
Inventor： Katsuhiko ONO , Hiroki TAKAHASHI , Takuya OKADA
CPC classification number: G02B6/0025 , G02B27/0172 , G02B17/006 , G02B17/004 , G02B1/10 , G02B2027/0178
Abstract: Provided is a light guide including: a base that has a first reflecting surface and a second reflecting surface and that propagates incident video light; and a plurality of half mirrors, each of which has a first surface and a second surface and is configured to include a dielectric multi-layer film, in which the plurality of half mirrors are disposed in the base such that the half mirrors are spaced from each other, the base and the plurality of half mirrors are configured such that the video light made incident into the base is incident on each of the first surface and the second surface of at least one of the plurality of half mirrors one or more times, and refractive indices of two outermost layers of the dielectric multi-layer film are 0.90n to 1.15n in a case in which a refractive index of the base is n.
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3.发明公开公开(公告)号：US20230205012A1
公开(公告)日：2023-06-29
申请号：US18067017
申请日：2022-12-16
Applicant: FUJIFILM CORPORATION
Inventor： Hiroki TAKAHASHI
IPC: G02F1/13363 , G02F1/1337 , G03B21/00
CPC classification number: G02F1/133632 , G02F1/133634 , G02F1/133734 , G03B21/006 , G02F2413/01 , G02F2413/12
Abstract: The phase difference compensation element that is used in combination with a liquid crystal cell provided with a liquid crystal layer in which an optical axis of liquid crystal molecules is inclined and that compensates for a phase difference of light generated in the liquid crystal layer, the phase difference compensation element includes a substrate and a phase difference film having at least one oblique vapor deposition layer on at least one substrate surface of the substrate, and the phase difference compensation element is disposed in an aspect in which an intersecting angle between a slow-axis direction of the phase difference film and a fast-axis direction of the liquid crystal layer, which is a direction perpendicular to a direction in which the inclined optical axis of the liquid crystal molecules is projected onto the substrate surface, is −25° to +25°.
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公开(公告)号：US20200033507A1
公开(公告)日：2020-01-30
申请号：US16591447
申请日：2019-10-02
Applicant: FUJIFILM Corporation
Inventor： Hiroki TAKAHASHI
Abstract: An antireflection film 3 provided on an optical substrate 2 of an optical member 1 has a reflectivity adjusting film 4 including a first layer 10, a second layer 11 having a refractive index higher than a refractive index of the first layer 10, a third layer 12 having a refractive index lower than a refractive index of the second layer 11, and a photocatalyst film 5 including one or more photocatalytically active layers 14 containing titanium dioxide, in which a thickness of the reflectivity adjusting film measured from a surface 4a is equal to or greater than 20 nm and less than 150 nm, the photocatalyst film 5 is provided between the reflectivity adjusting film 4 and the optical substrate 2, an interface 5a between the photocatalyst film 5 and the reflectivity adjusting film is disposed at position spaced apart from the surface 4a by a distance equal to or shorter than 150 nm, and a total thickness of the photocatalytically active layers 14 is equal to or greater than 350 nm and equal to or smaller than 1,000 nm.
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公开(公告)号：US20150103226A1
公开(公告)日：2015-04-16
申请号：US14513234
申请日：2014-10-14
Applicant: FUJIFILM Corporation
Inventor： Hiroki TAKAHASHI , Gorou TAKADA , Tatsuya FUJINAMI , Yasunobu KISHINE
CPC classification number: G02B5/208 , G02B1/115 , G02B1/118 , G02B5/005 , G02B13/0045 , G02B27/0018
Abstract: An optical element includes an optical base material and a light blocking portion. The optical base material transmits light therethrough. The light blocking portion is formed on part of a surface of the optical base material. The light blocking portion includes a light blocking layer and an antireflection layer that is formed on a non-adhesion surface with the optical base material in the light blocking layer. A refractive index of the antireflection layer is lower than a refractive index of the light blocking layer.
Abstract translation: 光学元件包括光学基底材料和遮光部分。 光学基材透过光。 遮光部形成在光学基材的表面的一部分上。 遮光部分包括在光阻挡层中与光学基材在非粘合表面上形成的遮光层和抗反射层。 抗反射层的折射率低于遮光层的折射率。
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Patent Agency Ranking
公开(公告)号：US20180217299A1
公开(公告)日：2018-08-02
申请号：US15938081
申请日：2018-03-28
Applicant: FUJIFILM Corporation
Inventor： Hiroki TAKAHASHI
Abstract: A hydrophilic multilayer film is provided on a substrate, the hydrophilic multilayer film having a multilayer film layer in which at least two kinds of layers having different refractive indices are laminated in order from the substrate side such that at least one or more of each kind of layer are laminated; and a hydrophilic thin film layer provided on the surface of the multilayer film layer. The multilayer film layer has one or more photocatalyst layers, and one layer of the photocatalyst layers is provided adjacently to the hydrophilic thin film layer. The hydrophilic thin film layer has a columnar structure having gaps extending between the top surface of the hydrophilic multilayer film and the face adjacent to the photocatalyst layer, and one or more of the photocatalyst layers included in the multilayer film layer has an oblique columnar structure including gaps oblique to the thickness direction.
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公开(公告)号：US20170160438A1
公开(公告)日：2017-06-08
申请号：US15440195
申请日：2017-02-23
Applicant: FUJIFILM Corporation
Inventor： Shinichiro SONODA , Tatsuya YOSHIHIRO , Hiroki TAKAHASHI , Mototaka KANAYA
CPC classification number: G02B1/118 , B32B3/30 , B32B7/02 , B32B9/00 , C03C17/3435 , C03C2217/734 , C23C14/0036 , C23C14/0676 , C23C14/08 , C23C14/083 , C23C14/34 , C23C14/3464 , C23C14/58 , G02B1/115 , G02B27/0018
Abstract: The antireflection film is provided on a surface of a light-transmitting substrate and includes a thin multi-layer film and a fine unevenness layer that are laminated in this order from the substrate side. The thin multi-layer film includes multiple layers. The fine unevenness layer has a structure in which an uneven structure having a shorter average pitch than a wavelength of used light is provided and in which a refractive index to the used light changes continuously depending on a continuous change in a space occupation of the uneven structure in a thickness direction of the thin multi-layer film. The multiple layers include: an oxide film having a relatively high refractive index that is formed of at least two metal elements or is formed of silicon and at least one metal element; and an oxynitride film having a relatively low refractive index.
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公开(公告)号：US20180011224A1
公开(公告)日：2018-01-11
申请号：US15700382
申请日：2017-09-11
Applicant: FUJIFILM Corporation
Inventor： Hiroki TAKAHASHI
Abstract: An antireflection film substrate that is provided on a surface of a substrate includes a surface layer having an alumina hydrate as a main component. The surface layer has an uneven structure in which a volume proportion of the alumina hydrate per unit volume decreases in a direction from the substrate side to a surface side, and a period of apexes distributed on the uneven structure on the surface side is configured to be equal to or less than a wavelength of light of which reflection is to be suppressed.
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9.发明申请OPTICAL COMPONENT, INFRARED CAMERA, AND METHOD FOR MANUFACTURING OPTICAL COMPONENT 审中-公开光学元件，红外摄像机和制造光学元件的方法公开(公告)号：US20160356926A1
公开(公告)日：2016-12-08
申请号：US15244299
申请日：2016-08-23
Applicant: FUJIFILM Corporation
Inventor： Hiroki TAKAHASHI , Mototaka KANAYA
CPC classification number: G02B1/118 , C03C3/321 , C03C17/007 , C03C17/008 , C03C2217/445 , C03C2217/732 , C03C2218/119 , G02B1/113 , H04N5/33
Abstract: The invention provides an optical component, an infrared camera including the optical component, and a method for manufacturing the optical component. Antireflection materials 3A are formed on a chalcogenide glass 2 of which a compositional ratio of germanium and selenium is 60 percent or greater. With respect to the antireflection materials 3A, an extinction coefficient to light of 10.5 μm is 0.01 or less, and a refractive index to light having a wavelength of 10.5 μm are greater than 1 and 2.6 or less. The antireflection materials 3A are formed on a surface of a chalcogenide glass 2 at an interval of 0.5 μm to 2.0 μm, so as to form an antireflection film 3. Adhesiveness of the antireflection film 3 is higher than that In a case where the surface of the chalcogenide glass 2 is evenly coated with the antireflection materials 3A.
Abstract translation: 本发明提供一种光学部件，包括该光学部件的红外线摄像机以及该光学部件的制造方法。 抗反射材料3A形成在锗和硒的组成比为60％以上的硫族化物玻璃2上。 对于防反射材料3A，10.5μm的光消光系数为0.01以下，对于波长为10.5μm的光的折射率大于1及2.6以下。 防反射材料3A以0.5μm至2.0μm的间隔形成在硫族化物玻璃2的表面上，以形成防反射膜3.防反射膜3的粘合性高于防反射膜3的表面 硫族化物玻璃2均匀地涂覆有抗反射材料3A。
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公开(公告)号：US20150226881A1
公开(公告)日：2015-08-13
申请号：US14689752
申请日：2015-04-17
Applicant: FUJIFILM Corporation
Inventor： Hiroki TAKAHASHI , Mototaka KANAYA
CPC classification number: G02B1/115 , C23C14/226 , G02B1/18
Abstract: An antireflection multilayer film is formed by alternately laminating high refractive index layers and low refractive index layers having indexes of refraction different from each other. The high refractive index layer is an oblique deposition layer formed by depositing an inorganic material such as tantalum pentoxide onto the surface of an optical element from a diagonal direction, and has minute internal structures composed of slant columnar structures growing along to the deposition direction. The low refractive index layer is an isotropic and dense layer.
Abstract translation: 通过交替层叠具有彼此不同的折射率的高折射率层和低折射率层来形成抗反射多层膜。 高折射率层是通过从对角线方向在光学元件的表面上沉积诸如五氧化二钽的无机材料而形成的倾斜沉积层，并且具有沿着沉积方向生长的倾斜柱状结构的微小的内部结构。 低折射率层是各向同性且致密的层。
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