A photoresist composition including a photoresist composition includes a photo-luminescence nanocomposite, a photopolymerizable monomer, a first photopolymerization initiator, a second photopolymerization initiator, a binder resin, and a solvent. The photo-luminescence nanocomposite includes a first quantum dot nanocomposite, a second quantum dot nanocomposite, or a combination thereof. The first quantum dot nanocomposite includes a first quantum dot nanoparticle and a first coating layer surrounding the first quantum dot nanoparticle, the first coating layer including a first inorganic material. The second quantum dot nanocomposite includes a second quantum dot nanoparticle and a second coating layer surrounding the second quantum dot nanoparticle, the second coating layer including a second inorganic material. The first photopolymerization initiator includes an oxime-based compound, and the second photopolymerization initiator includes an acetophenone-based compound, a thioxanthone-based compound, a benzophenone-based compound, or a combination thereof.