Invention Application
- Patent Title: METHODS AND APPARATUS FOR PROCESSING CHAMBER CLEANING END POINT DETECTION
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Application No.: US15273631Application Date: 2016-09-22
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Publication No.: US20180082827A1Publication Date: 2018-03-22
- Inventor: Young-Jin Choi , Su Ho Cho , Beomsoo Park , Fei Peng , Soo Young Choi
- Applicant: Applied Materials, Inc.
- Main IPC: H01J37/32
- IPC: H01J37/32 ; G01N21/73 ; C23C16/50 ; C23C16/455

Abstract:
Embodiments provide systems, methods and apparatus for detecting a cleaning endpoint of a cleaning process performed within a processing chamber. Embodiments include a spectrometer adapted to measure a spectrum response over time of a cleaning reaction within a processing chamber during a cleaning process; and a lens system coupled to the spectrometer and disposed to focus on a selected area within the processing chamber via a viewport and to amplify intensity of radiation from the selected area during the cleaning process. The selected area is chosen based on being the expected location of the last cleaning reaction during the cleaning process within the processing chamber (e.g., a corner in a rectangular chamber). Numerous other aspects are provided.
Public/Granted literature
- US10043641B2 Methods and apparatus for processing chamber cleaning end point detection Public/Granted day:2018-08-07
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