The present invention provides a manufacturing method of an array substrate, comprising a step of forming insulation layers in a driving area and a display area of the array substrate, wherein thin film transistors are provided in both the display area and the driving area; the insulation layers are arranged between gate electrodes and active layers of the thin film transistors. A thickness of the insulation layer of the thin film transistor in the driving area is larger than a thickness of the insulation layer of the thin film transistor in the display area.