Invention Application
- Patent Title: APPARATUS FOR MANUFACTURING A SILICON CARBIDE WAFER
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Application No.: US15715940Application Date: 2017-09-26
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Publication No.: US20180090350A1Publication Date: 2018-03-29
- Inventor: Ruggero ANZALONE , Nicolo FRAZZETTO , Aldo RACITI , Marco Antonio SALANITRI , Giuseppe ABBONDANZA , Giuseppe D'ARRIGO
- Applicant: STMICROELECTRONICS S.R.L. , Consiglio Nazionale delle Ricerche-Istituto per la Microelettronica e Microsistemi
- Main IPC: H01L21/67
- IPC: H01L21/67 ; H01L21/02

Abstract:
Various embodiments provide a reaction chamber including a support, a receptacle, and a sponge. The support includes a plurality of bars that are spaced from each other by a plurality of openings. Each of the bars has side surfaces that are slanted or tilted downward such that melted material may readily flow through the openings. The support is covered with a coating of silicon carbide to prevent materials from adhering to the support. The receptacle underlies the support and is configured to collect any melted material that is drained through the openings of the support. The sponge is positioned in the receptacle and under the support. The sponge is configured to absorb any melted material that is collected by the receptacle.
Public/Granted literature
- US10475673B2 Apparatus for manufacturing a silicon carbide wafer Public/Granted day:2019-11-12
Information query
IPC分类: