Invention Application
- Patent Title: BARREL PLATING OR HIGH-SPEED ROTARY PLATING USING A NEUTRAL TIN PLATING SOLUTION
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Application No.: US15730244Application Date: 2017-10-11
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Publication No.: US20180135195A1Publication Date: 2018-05-17
- Inventor: Makoto Kondo , Yoko Mizuno
- Applicant: Rohm and Haas Electronic Materials LLC
- Applicant Address: US MA Marlborough
- Assignee: Rohm and Haas Electronic Materials LLC
- Current Assignee: Rohm and Haas Electronic Materials LLC
- Current Assignee Address: US MA Marlborough
- Priority: JP2016-220435 20161111
- Main IPC: C25D3/32
- IPC: C25D3/32 ; C25D17/20 ; C25D7/00

Abstract:
A barrel plating or high-speed rotary plating method for electronic components, and a neutral tin plating solution used therein. A plating solution that includes (A) stannous ions, (B) an acid or a salt, (C) a complexing agent, and (D) a diamine that has a polyoxyalkylene chain, and that has a pH in a range between 4 and 8 is used. The use of this neutral tin plating solution prevents the electronic components from coupling together during the barrel plating, enabling an improvement in manufacturability in barrel plating.
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