发明申请
- 专利标题： ALIGNMENT SYSTEM
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申请号： US15575069申请日： 2016-03-14
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公开(公告)号： US20180149987A1公开(公告)日： 2018-05-31
- 发明人: Simon Gijsbert Josephus MATHIJSSEN , Arie Jeffrey DEN BOEF , Alessandro POLO , Patricius Aloysius Jacobus TINNEMANS , Adrianus Johannes Hendrikus SCHELLEKENS , Elahe YEGANEGI DASTGERDI , Willem Marie Julia Marcel COENE , Erik Willem BOGAART , Simon Reinald HUISMAN
- 申请人： ASML Netherlands B.V.
- 申请人地址： NL Veldhoven
- 专利权人： ASML Netherlands B.V.
- 当前专利权人： ASML Netherlands B.V.
- 当前专利权人地址： NL Veldhoven
- 优先权： EP15170832.8 20150605
- 国际申请： PCT/EP2016/055388 WO 20160314
- 主分类号： G03F9/00
- IPC分类号： G03F9/00 ; G03F7/20
摘要：
An alignment system, method and lithographic apparatus are provided for determining the position of an alignment mark, the alignment system comprising a first system configured to produce two overlapping images of the alignment mark that are rotated by around 180 degrees with respect to one another, and a second system configured to determine the position of the alignment mark from a spatial distribution of an intensity of the two overlapping images.
公开/授权文献
- US10585363B2 Alignment system 公开/授权日：2020-03-10
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